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Origins of optical absorption and emission lines in AlN

机译:AlN中光吸收和发射线的起源

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摘要

To aid the development of AlN-based optoelectronics, it is essential to identify the defects that cause unwanted light absorption and to minimize their impact. Using hybrid functional calculations, we investigate the role of native defects and their complexes with oxygen, a common impurity in AlN. We find that Al vacancies are the source of the absorption peak at 3.4 eV observed in irradiated samples and of the luminescence signals at 2.78 eV. The absorption peak at ~4.0 eV and higher, and luminescence signals around 3.2 and 3.6eV observed in AlN samples with high oxygen concentrations are attributed to complexes of Al vacancies and oxygen impurities. We also propose a transition involving Al and N vacancies and oxygen impurities that may be a cause of the absorption band peaked at 2.9 eV.
机译:为了帮助开发基于AlN的光电器件,必须确定导致不想要的光吸收的缺陷并使它们的影响最小化。使用混合功能计算,我们研究了天然缺陷及其与氧气(AlN中的常见杂质)的复合物的作用。我们发现铝空位是在被辐照样品中观察到的在3.4 eV处的吸收峰的源和在2.78 eV处的发光信号的源。在高氧浓度的AlN样品中,在〜4.0 eV或更高的吸收峰,以及在3.2和3.6eV附近观察到的发光信号归因于Al空位和氧杂质的复合物。我们还提出了涉及Al和N空位以及氧杂质的过渡,这可能是导致吸收带在2.9 eV达到峰值的原因。

著录项

  • 来源
    《Applied Physics Letters》 |2014年第11期|111104.1-111104.5|共5页
  • 作者单位

    Materials Department, University of California, Santa Barbara, California 93106-5050, USA,Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA;

    Materials Department, University of California, Santa Barbara, California 93106-5050, USA;

    Materials Department, University of California, Santa Barbara, California 93106-5050, USA,Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, D-14195 Berlin, Germany;

    Materials Department, University of California, Santa Barbara, California 93106-5050, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 03:15:59

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