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Nanosecond switching in GeSe phase change memory films by atomic force microscopy

机译:GeSe相变存储膜中的纳秒切换的原子力显微镜

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摘要

Nanosecond scale threshold switching is investigated with conducting atomic force microscopy (AFM) for an amorphous GeSe film. Switched bits exhibit 2-3 orders of magnitude variations in conductivity, as demonstrated in phase change based memory devices. Through the nm-scale AFM probe, this crystallization was achieved with pulse durations of as low as 15 ns, the fastest reported with scanning probe based methods. Conductance AFM imaging of the switched bits further reveals correlations between the switched volume, pulse amplitude, and pulse duration. The influence of film heterogeneities on switching is also directly detected, which is of tremendous importance for optimal device performance.
机译:使用导电原子力显微镜(AFM)研究非晶GeSe膜的纳秒级阈值切换。开关位在电导率上表现出2-3个数量级的变化,如基于相变的存储设备所示。通过纳米级的AFM探针,可以以低至15 ns的脉冲持续时间实现这种结晶,这是基于扫描探针的方法中最快的。开关位的电导原子力显微镜成像进一步揭示了开关量,脉冲幅度和脉冲持续时间之间的相关性。薄膜异质性对开关的影响也可以直接检测到,这对于优化器件性能至关重要。

著录项

  • 来源
    《Applied Physics Letters》 |2014年第5期|053109.1-053109.4|共4页
  • 作者单位

    Department of Materials Science and Engineering, 97 North Eagleville Road, Unit 3136, Storrs, Connecticut 06269-3136, USA;

    Department of Physics, Lancaster University, Lancaster LA1 4YB, United Kingdom;

    Department of Materials Science and Engineering, Korea Aerospace University, Goyang-si, Gyeonggi-do, 412-791, South Korea;

    Electronic Materials Research Center, Korea Institute of Science and Technology, Seongbuk-gu, Seoul 136-791, South Korea;

    Electronic Materials Research Center, Korea Institute of Science and Technology, Seongbuk-gu, Seoul 136-791, South Korea;

    Department of Physics, Lancaster University, Lancaster LA1 4YB, United Kingdom;

    Department of Materials Science and Engineering, 97 North Eagleville Road, Unit 3136, Storrs, Connecticut 06269-3136, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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