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首页> 外文期刊>Applied Physics Letters >Controlling magnetic domain wall motion in the creep regime in He~+-irradiated CoFeB/MgO films with perpendicular anisotropy
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Controlling magnetic domain wall motion in the creep regime in He~+-irradiated CoFeB/MgO films with perpendicular anisotropy

机译:在He〜+辐射的具有垂直各向异性的CoFeB / MgO薄膜的蠕变范围内控制磁畴壁运动

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摘要

This study presents the effective tuning of perpendicular magnetic anisotropy in CoFeB/MgO thin films by He~+ ion irradiation and its effect on domain wall motion in a low field regime. Magnetic anisotropy and saturation magnetisation are found to decrease as a function of the irradiation dose which can be related to the observed irradiation-induced changes in stoichiometry at the CoFeB/ MgO interface. These changes in the magnetic intrinsic properties of the film are reflected in the domain wall dynamics at low magnetic fields (H) where irradiation is found to induce a significant decrease in domain wall velocity (v). For all irradiation doses, domain wall velocities at low fields are well described by a creep law, where Ln(v) vs. H~(-1/4) behaves linearly, up to a maximum field H~*, which has been considered as an approximation to the value of the depinning field H_(dep). In turn, H~*≈H_(dep) is seen to increase as a function of the irradiation dose, indicating an irradiation-induced extension of the creep regime of domain wall motion.
机译:这项研究提出了通过He〜+离子辐照有效地调节CoFeB / MgO薄膜中垂直磁各向异性的方法,以及它在低场条件下对畴壁运动的影响。发现磁各向异性和饱和磁化强度随辐照剂量而降低,这可能与在CoFeB / MgO界面处观察到的辐照引起的化学计量变化有关。膜的磁性本征特性的这些变化反映在低磁场(H)下的畴壁动力学中,在该磁场中,发现辐射会引起畴壁速度(v)的显着降低。对于所有辐照剂量,低场的畴壁速度都可以通过蠕变定律很好地描述,其中Ln(v)与H〜(-1/4)呈线性关系,直至达到最大场H〜*。近似于固定字段H_(dep)的值。进而,H〜*≈H_(dep)随辐照剂量的增加而增加,表明辐照引起的畴壁运动蠕变状态的扩展。

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  • 来源
    《Applied Physics Letters》 |2015年第3期|032401.1-032401.4|共4页
  • 作者单位

    Institut d'Electronique Fondamentale, Universite Paris-Sud, UMR CNRS 8622, 91405 Orsay, France;

    Institut d'Electronique Fondamentale, Universite Paris-Sud, UMR CNRS 8622, 91405 Orsay, France;

    Institut d'Electronique Fondamentale, Universite Paris-Sud, UMR CNRS 8622, 91405 Orsay, France;

    Institut d'Electronique Fondamentale, Universite Paris-Sud, UMR CNRS 8622, 91405 Orsay, France;

    Institut d'Electronique Fondamentale, Universite Paris-Sud, UMR CNRS 8622, 91405 Orsay, France;

    Institut d'Electronique Fondamentale, Universite Paris-Sud, UMR CNRS 8622, 91405 Orsay, France;

    Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, 20864 Agrate (MB), Italy;

    Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, 20864 Agrate (MB), Italy;

    Singulus Technology AG, Hanauer Landstrasse 103, 63796 Kahl am Main, Germany;

    Institut d'Electronique Fondamentale, Universite Paris-Sud, UMR CNRS 8622, 91405 Orsay, France;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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