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Effects of dopant concentration on structural and near-infrared luminescence of Nd~(3+)-doped beta-Ga_2O_3 thin films

机译:掺杂剂浓度对Nd〜(3+)掺杂β-Ga_2O_3薄膜结构和近红外发光的影响

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摘要

We have investigated structural and near-infrared (MR) luminescence of Nd~(3+)-doped β-Ga_2O_3 thin films (Nd:Ga_2O_3) with different Nd~(3+) doping concentrations. With an increase of Nd~(3+) content, the crystal lattice of the films expands, while the energy band gap shrinks. Moreover, NIR luminescence is investigated as a function of Nd~(3+) doping concentration. The measured results are related to the structural change and energy transfer of cross relaxation process ascribed to ~4F_(3/2)-~4I_(9/2), ~4F_(3/2)-~4I_(11/2). and ~4F_(3/2)-~4I_(13/2) of the phosphor films. This work implies that the enhanced NIR luminescence and blue-shift observation are associated with the lattice distortion and the variation in the crystal field of Nd: Ga_2O_3.
机译:我们研究了不同掺杂浓度的Nd〜(3+)掺杂的β-Ga_2O_3薄膜(Nd:Ga_2O_3)的结构和近红外(MR)发光。随着Nd〜(3+)含量的增加,薄膜的晶格膨胀,能带隙减小。此外,研究了NIR发光与Nd〜(3+)掺杂浓度的关系。测量结果与归因于〜4F_(3/2)-〜4I_(9/2),〜4F_(3/2)-〜4I_(11/2)的交叉弛豫过程的结构变化和能量转移有关。荧光体膜的〜4F_(3/2)~~ 4I_(13/2)。这项工作暗示增强的NIR发光和蓝移观察与Nd:Ga_2O_3的晶格畸变和晶场变化有关。

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  • 来源
    《Applied Physics Letters》 |2015年第17期|171910.1-171910.4|共4页
  • 作者单位

    Laboratory of Optoelectronics Materials and Devices, School of Science, Beijing University of Posts and Telecommunications, Beijing 100876, China,State Key Laboratory of Information Photonics and Optical Communications, Beijing University of Posts and Telecommunications, Beijing 100876, China;

    Department of Applied Physics, The Hong Kong Polytechnic University, Hong Kong, China,The Hong Kong Polytechnic University Shenzhen Research Institute, Shenzhen 518057, China;

    Laboratory of Optoelectronics Materials and Devices, School of Science, Beijing University of Posts and Telecommunications, Beijing 100876, China;

    Laboratory of Optoelectronics Materials and Devices, School of Science, Beijing University of Posts and Telecommunications, Beijing 100876, China;

    Laboratory of Optoelectronics Materials and Devices, School of Science, Beijing University of Posts and Telecommunications, Beijing 100876, China;

    Department of Physics, The State University of New York at Potsdam, Potsdam, New York 13676-2294, USA;

    Laboratory of Optoelectronics Materials and Devices, School of Science, Beijing University of Posts and Telecommunications, Beijing 100876, China,State Key Laboratory of Information Photonics and Optical Communications, Beijing University of Posts and Telecommunications, Beijing 100876, China;

    Department of Physics, The State University of New York at Potsdam, Potsdam, New York 13676-2294, USA;

    Laboratory of Optoelectronics Materials and Devices, School of Science, Beijing University of Posts and Telecommunications, Beijing 100876, China,Center for Optoelectronics Materials and Devices, Department of Physics, Zhejiang Sci-Tech University, Hangzhou, Zhejiang 310018, China;

    Department of Applied Physics, The Hong Kong Polytechnic University, Hong Kong, China,The Hong Kong Polytechnic University Shenzhen Research Institute, Shenzhen 518057, China;

    Laboratory of Optoelectronics Materials and Devices, School of Science, Beijing University of Posts and Telecommunications, Beijing 100876, China,State Key Laboratory of Information Photonics and Optical Communications, Beijing University of Posts and Telecommunications, Beijing 100876, China;

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  • 正文语种 eng
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  • 入库时间 2022-08-18 03:15:05

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