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Investigation of dislocations in Nb-doped SrTiO_3 by electron-beam-induced current and transmission electron microscopy

机译:电子束感应电流和透射电镜研究Nb掺杂SrTiO_3中的位错

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摘要

This paper aims to clarify the electrical activities of dislocations in Nb-doped SrTiO_3 substrates and the role of dislocations in the resistance switching phenomenon in Pt/SrTiO_3 Schottky contacts. The electrical activities of dislocations have been studied by electron-beam-induced current (EBIC) technique. EBIC has found that dislocations can exhibit dark or bright contrast depending on their character and band bending condition. The character of dislocations has been analysed based on chemical etching and transmission electron microscopy. These data suggested that not all the dislocations contribute to the switching phenomenon. The active dislocations for resistance switching were discussed.
机译:本文旨在阐明Nb掺杂SrTiO_3衬底中位错的电活动以及位错在Pt / SrTiO_3肖特基接触中的电阻转换现象中的作用。通过电子束感应电流(EBIC)技术研究了位错的电活动。 EBIC已发现,位错可以表现出暗或亮的对比度,具体取决于其特性和弯曲带条件。位错的特征已基于化学蚀刻和透射电子显微镜进行了分析。这些数据表明并非所有的位错都导致了开关现象。讨论了用于电阻切换的有源位错。

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  • 来源
    《Applied Physics Letters》 |2015年第10期|102109.1-102109.4|共4页
  • 作者单位

    WPI Center for Materials Nanoarchitectonics, National Institute for Materials Science, Tsukuba 305-0044, Japan;

    WPI Center for Materials Nanoarchitectonics, National Institute for Materials Science, Tsukuba 305-0044, Japan;

    Fukushima Renewable Energy Institute, Koriyama 963-0215, Japan;

    Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan;

    Institute of Physics and Beijing National Laboratory for Condensed Matter Physics, Chinese Academy of Sciences, Beijing 100190, China;

    Department of Electrical and Electronic Engineering, Meiji University, Kawasaki 214-8571, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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