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Strain engineering of quantum dots for long wavelength emission: Photoluminescence from self-assembled InAs quantum dots grown on GaAs(001) at wavelengths over 1.55 μm

机译:用于长波长发射的量子点的应变工程:在GaAs(001)上以超过1.55μm的波长生长的自组装InAs量子点的光致发光

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摘要

Photoluminescence (PL) at wavelengths over 1.55 μm from self-assembled InAs quantum dots (QDs) grown on GaAs(00l) is observed at room temperature (RT) and 4K using a bilayer structure with thin cap. The PL peak has been known to redshift with decreasing cap layer thickness, although accompanying intensity decrease and peak broadening. With our strain-controlled bilayer structure, the PL intensity can be comparable to the ordinary QDs while realizing peak emission wavelength of 1.61 μm at 4K and 1.73 μm at RT. The key issue lies in the control of strain not only in the QDs but also in the cap layer. By combining with underlying seed QD layer, we realize strain-driven bandgap engineering through control of strain in the QD and cap layers.
机译:使用具有薄帽的双层结构,在室温(RT)和4K下,观察到在GaAs(00l)上生长的自组装InAs量子点(QD)发出的波长超过1.55μm的光致发光(PL)。已知PL峰会随着覆盖层厚度的减小而发生红移,尽管伴随着强度下降和峰展宽。利用我们的应变控制双层结构,PL强度可以与普通QD相媲美,同时在4K时实现峰值发射波长为1.61μm,在RT时实现峰值发射波长为1.73μm。关键问题在于,不仅要控制量子点,还要控制盖层的应变。通过与底层种子QD层结合,我们通过控制QD和盖层中的应变来实现应变驱动的带隙工程。

著录项

  • 来源
    《Applied Physics Letters》 |2015年第8期|082103.1-082103.4|共4页
  • 作者

    K. Shimomura; I. Kamiya;

  • 作者单位

    Toyota Technological Institute 2-12-1 Hisakata, Tempaku, Nagoya 468-8511, Japan;

    Toyota Technological Institute 2-12-1 Hisakata, Tempaku, Nagoya 468-8511, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-18 03:15:03

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