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首页> 外文期刊>Applied Physics Letters >Dual optical marker Raman characterization of strained GaN-channels on AlN using AlN/GaN/AlN quantum wells and ~(15)N isotopes
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Dual optical marker Raman characterization of strained GaN-channels on AlN using AlN/GaN/AlN quantum wells and ~(15)N isotopes

机译:使用AlN / GaN / AlN量子阱和〜(15)N同位素对AlN上的应变GaN通道进行双光学标记拉曼表征

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摘要

This work shows that the combination of ultrathin highly strained GaN quantum wells embedded in an AlN matrix, with controlled isotopic concentrations of Nitrogen enables a dual marker method for Raman spectroscopy. By combining these techniques, we demonstrate the effectiveness in studying strain in the vertical direction. This technique will enable the precise probing of properties of buried active layers in heterostructures, and can be extended in the future to vertical devices such as those used for optical emitters and for power electronics.
机译:这项工作表明,嵌入AlN基质中的超薄高应变GaN量子阱与受控的氮同位素浓度相结合,可实现用于拉曼光谱的双标记方法。通过结合这些技术,我们证明了研究垂直方向应变的有效性。该技术将能够精确探测异质结构中埋入式有源层的特性,并且将来可以扩展到垂直器件,例如用于光发射器和功率电子器件的器件。

著录项

  • 来源
    《Applied Physics Letters》 |2015年第4期|041906.1-041906.5|共5页
  • 作者单位

    Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA;

    Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA;

    Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA;

    Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA;

    Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA;

    Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA;

    Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA;

    Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA;

    Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA;

    Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA;

    Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA,Ioffe Physico-Technical Institute, Russian Academy of Sciences, Saint Petersburg 194021, Russia;

    Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA;

    Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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