机译:Si和Ge纳米膜基柔性金属氧化物半导体器件在弯曲条件下的电容电压特性
Department of Electrical and Computer Engineering, University of Wisconsin-Madison, Wisconsin 53706, USA,Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 305-701, South Korea;
Department of Electrical and Computer Engineering, University of Wisconsin-Madison, Wisconsin 53706, USA;
Department of Electrical and Computer Engineering, University of Wisconsin-Madison, Wisconsin 53706, USA;
Department of Electrical Engineering, NanoFAB Center, University of Texas, Arlington, Texas 76019, USA;
Department of Electrical and Computer Engineering, University of Wisconsin-Madison, Wisconsin 53706, USA;
机译:一种基于电流 - 电压/电容 - 电压迹线的累积和Si器件中的4H-SiC金属氧化物半导体器件的表征研究与T的平均氧化物场的推导
机译:基于应变Si / SiGe结构的N型金属氧化物半导体电容器的高频电容电压特性
机译:电容电压滞后研究InGaAs金属氧化物半导体器件上沉积的Al_2O_3和HfO_2高k电介质中氧化物缺陷能级的分布
机译:基于MX2的金属氧化物半导体器件电容 - 电压特性和双栅操作
机译:使用单晶纳米爆发和高性能柔性电子无源器件的格子不匹配的异构应用
机译:用于柔性电子设备应用的双夹梁开关上弯曲特性的多物理模型
机译:超大规模集成金属氧化物半导体栅氧化物应用中金属Ta2O5硅电容器的电容电压特性研究
机译:mNOs器件的准静态电容 - 电压特性。