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Tuning and stabilizing topological insulator Bi_2Se_3 in the intrinsic regime by charge extraction with organic overlayers

机译:通过使用有机覆盖层进行电荷提取来调节和稳定拓扑绝缘子Bi_2Se_3的本征状态

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摘要

In this work, we use charge extraction via organic overlayer deposition to lower the chemical potential of topological insulator (TI) Bi_2Se_3 thin films into the intrinsic (bulk-insulating) regime. We demonstrate the tuning and stabilization of intrinsic topological insulators at high mobility with low-cost organic films. With the protection of the organic charge extraction layers tetrafluorotetracyano-quinodimethane or tris(acetylacetonato)cobalt(Ⅲ) (Co(acac)_3), the sample is stable in the atmosphere with chemical potential ~135 meV above the Dirac point (85 meV below the conduction band minimum, well within the topological insulator regime) after four months, which is an extraordinary level of environmental stability. The Co complex demonstrates the use of an organometallic for modulating TI charge density. The mobility of surface state electrons is enhanced as high as ~2000 cm~2/V s. Even at room temperature, a true topologically insulating state is realized and stabilized for months' exposure to the atmosphere.
机译:在这项工作中,我们通过有机覆盖层沉积使用电荷提取将拓扑绝缘体(TI)Bi_2Se_3薄膜的化学势降低到固有(本体绝缘)状态。我们展示了低成本有机薄膜在高迁移率下本征拓扑绝缘体的调谐和稳定性。在有机电荷提取层的保护下,四氟四氰基-喹二甲烷或三(乙酰丙酮基)钴(Ⅲ)(Co(acac)_3)在空气中稳定,样品的电势高于狄拉克点〜135 meV(低于85 meV)在四个月后达到最小导带,完全在拓扑绝缘体范围内),这是非常高的环境稳定性。 Co络合物证明了使用有机金属来调节TI电荷密度。表面态电子的迁移率提高到〜2000 cm〜2 / V s。即使在室温下,也可以实现真正的拓扑绝缘状态,并在暴露于大气中数月后仍保持稳定。

著录项

  • 来源
    《Applied Physics Letters》 |2016年第22期|221603.1-221603.5|共5页
  • 作者单位

    Department of Physics and Astronomy, The Johns Hopkins University, Baltimore, Maryland 21218, USA;

    Department of Material Science and Engineering, The Johns Hopkins University, Baltimore, Maryland 21218, USA;

    Department of Material Science and Engineering, Rutgers, The State University of New Jersey, Piscataway, New Jersey 08854, USA;

    Department of Physics and Astronomy, The Johns Hopkins University, Baltimore, Maryland 21218, USA;

    Department of Physics and Astronomy, Rutgers, The State University of New Jersey, Piscataway, New Jersey 08854, USA;

    Department of Physics and Astronomy, Rutgers, The State University of New Jersey, Piscataway, New Jersey 08854, USA;

    Department of Material Science and Engineering, The Johns Hopkins University, Baltimore, Maryland 21218, USA;

    Department of Physics and Astronomy, The Johns Hopkins University, Baltimore, Maryland 21218, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 03:14:42

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