The impact of ultra-thin titania interlayers on open circuit voltage and carrier lifetime in thin film solar cells

摘要

We study the effects of modifying indium tin oxide electrodes with ultrathin titania (TiO_2) layers grown via plasma-enhanced atomic layer deposition (PE-ALD). We find an optimal thickness of PE-ALD-grown titania by tracking performance, which initially increases, peaks, and eventually decreases with increasing TiO_2 thickness. We use scanning Kelvin probe microscopy (SKPM) to measure both the local work function and its distribution as a function of TiO_2 thickness. We find that the variance in contact potential difference across the surface of the film is related to either the amorphous or anatase TiO_2 form. Finally, we use local SKPM recombination rate experiments, supported by bulk transient photovoltage and charge extraction measurements. We show that the optimum TiO_2 thickness is the one for which the carrier lifetime is the longest and the charge carrier density is the highest, when the TiO_2 is amorphous, in agreement with the device measurements.