机译:使用IrO_x / GdO_x / Al_2O_3 / TiN结构的互补电阻开关特性的演变
Thin Film Nano Technology Laboratory, Department of Electronic Engineering, Chang Gung University, 259 Wen-Hwa 1st Rd., Kwei-Shan, Tao-Yuan 333, Taiwan;
Thin Film Nano Technology Laboratory, Department of Electronic Engineering, Chang Gung University, 259 Wen-Hwa 1st Rd., Kwei-Shan, Tao-Yuan 333, Taiwan;
Thin Film Nano Technology Laboratory, Department of Electronic Engineering, Chang Gung University, 259 Wen-Hwa 1st Rd., Kwei-Shan, Tao-Yuan 333, Taiwan;
Material and Chemical Research Laboratories (MRL), Industrial Technology Research Institute (ITRI), Hsinchu 195, Taiwan;
机译:使用IrO_x / GdO_x / WO_x / W结构的与地层极性相关的改进的电阻开关存储器性能
机译:底部电极的表面粗糙度对300℃玻璃上制备的Al / Al_2O_3 / Al和Al / Al_2O_3 / W结构的电阻转换特性的影响
机译:通过选择IrO_x / TaO_x / WO_x / W结构中的电形成极性来改善电阻切换参数的均匀性
机译:使用IrO_x / GdO_x / W交叉杆结构的无成型电阻开关存储器特性
机译:基于五氧化二铜-铂金器件结构的纳米交叉电阻开关存储器的制作
机译:HtO2 / TiO2 / HfO2三层结构RRAM器件在原子层沉积制备的Pt和TiN涂层衬底上的双极电阻转换特性
机译:使用IROX / GDOX / AL2O3 / TIN结构的互补电阻切换特性的演化