Adaptive synthesis of optical pattern for photonic crystal lithography

摘要

Intensity patterns for optical lithography are synthesized with phase-controlled multi-beam interference. By using a programmable spatial light modulator, reconfigurable intensity patterns can be generated and optimized to approach an objective intensity distribution. A self-adaptive annealing algorithm is applied to feedback control to obtain the predetermined intensity distribution. Typical photonic crystal with zigzag waveguides and micro-cavities are fabricated with a one-step-exposure lithographic technique.