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In-gap states of an amorphous In-Ga-Zn-O thin film studied via high-sensitivity ultraviolet photoemission spectroscopy using low-energy photons

机译:使用低能量光子的高灵敏度紫外线光扫描光谱研究了无定形IN-ZN-O薄膜的间隙状态

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摘要

Low-density electronic states in the energy gap of an amorphous In-Ga-Zn-O film control device performance. Herein, density of states (DOS) distribution from valence band to the in-gap states of 10(14) cm(-3) eV(-1) level was determined using high-sensitivity UV photoemission spectroscopy. Exponential tail states accompanying two energetically-localized states were directly observed as reported previously. The observed slope of the exponential tail state was different from the Urbach energy derived using photothermal deflection spectroscopy, indicating the importance of directly observing the DOS of in-gap states.
机译:低密度电子状态在无定形IN-ZN-O膜控制装置性能的能隙中。 这里,使用高灵敏度UV光电激素光谱法测定从价带与10(14 )cm(-3)EV(-1)级的间隙状态的状态(DOS)分布的密度。 如前所述,直接观察到伴随两种能量局部局部状态的指数尾状状态。 观察到的指数尾部状态的斜率与使用光热偏转光谱衍生的Urbach能量不同,表明直接观察间隙状态的态度的重要性。

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