Sub-15nm Hard X-Ray Focusing with a New Total-Reflection Zone Plate

摘要

A new total-reflection zone plate that consists of a reflective zone pattern with varied-space on a flat substrate was fabricated for hard X-ray nanofocusing. This device is much easier to fabricate than other focusing devices. This is because its focusing size is much smaller than its finest constituent structure since it exploits the effect of glancing X-rays by having a small total reflection angle. Its focusing properties were evaluated using 10-keV X-rays and a focusing size of 14.4nm was achieved.