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首页> 外文期刊>Annales de l'I.H.P >Pulsed Laser Deposition and Ionic Liquid Gate Control of Epitaxial Bi2Se3 Thin Films
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Pulsed Laser Deposition and Ionic Liquid Gate Control of Epitaxial Bi2Se3 Thin Films

机译:外延Bi2Se3薄膜的脉冲激光沉积和离子液体浇口控制

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摘要

High-quality epitaxial thin films of the topological insulator Bi2Se3 with atomically flat surfaces have been grown on lnP(111 )A substrates by means of pulsed laser deposition, which can target a variety of materials for the further chemical tuning of topological insulators. Utilizing an ionic liquid gate structure fabricated on the top of a thin (~6nm thick) film, we have controlled the sheet carrier density nSheet (UP t0 AnSheet ~ 1.3 x 1014cm~2). The sharp negative magnetoconductance due to the two-dimensional weak antilocalization has been observed and the phase coherence length is modulated with the gate voltage.
机译:通过脉冲激光沉积,已在lnP(111)A衬底上生长了具有原子平面的拓扑绝缘体Bi2Se3的高质量外延薄膜,该薄膜可靶向多种材料,以进一步化学调整拓扑绝缘体。利用在薄(〜6nm厚)薄膜顶部制造的离子液体门结构,我们控制了薄片载流子密度nSheet(UP t0 AnSheet〜1.3 x 1014cm〜2)。已经观察到由于二维弱反局部化而导致的尖锐的负磁导,并且相干长度由栅极电压调制。

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  • 来源
    《Annales de l'I.H.P》 |2011年第8期|p.083001.1-083001.3|共3页
  • 作者单位

    Department of Applied Physics and Quantum Phase Electronics Center, University of Tokyo, Bunkyo, Tokyo 113-8656, Japan,Multiferroics project, ERATO, Japan Science and Technology Agency (JST), c/o Department of Applied Physics, University of Tokyo,Bunkyo, Tokyo 113-8656, Japan;

    Department of Applied Physics and Quantum Phase Electronics Center, University of Tokyo, Bunkyo, Tokyo 113-8656, Japan;

    Department of Applied Physics and Quantum Phase Electronics Center, University of Tokyo, Bunkyo, Tokyo 113-8656, Japan;

    Department of Applied Physics and Quantum Phase Electronics Center, University of Tokyo, Bunkyo, Tokyo 113-8656, Japan;

    Department of Applied Physics and Quantum Phase Electronics Center, University of Tokyo, Bunkyo, Tokyo 113-8656, Japan;

    Department of Applied Physics and Quantum Phase Electronics Center, University of Tokyo, Bunkyo, Tokyo 113-8656, Japan,Cross-Correlated Materials Research Group (CMRG) and Correlated Electron Research Group (CERG), Advanced Science Institute, RIKEN,Wako, Saitama 351-0198, Japan;

    Department of Applied Physics and Quantum Phase Electronics Center, University of Tokyo, Bunkyo, Tokyo 113-8656, Japan,Cross-Correlated Materials Research Group (CMRG) and Correlated Electron Research Group (CERG), Advanced Science Institute, RIKEN,Wako, Saitama 351-0198, Japan;

    Department of Applied Physics and Quantum Phase Electronics Center, University of Tokyo, Bunkyo, Tokyo 113-8656, Japan,Multiferroics project, ERATO, Japan Science and Technology Agency (JST), c/o Department of Applied Physics, University of Tokyo,Bunkyo, Tokyo 113-8656, Japan,Cross-Correlated Materials Research Group (CMRG) and Correlated Electron Research Group (CERG), Advanced Science Institute, RIKEN,Wako, Saitama 351-0198, Japan;

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