Spectrally resolved phase-shifting interferometry of transparent thin films: sensitivity of thickness measurements

摘要

Spectrally resolved white-light phase-shifting interference microscopy can be used for rapid and accurate measurements of the thickness profile of transparent thin-film layers deposited upon patterned structures exhibiting steps and discontinuities. We examine the sensitivity of this technique and show that it depends on the thickness of the thin-film layer as well as its refractive index. The results of this analysis are also valid for any other method based on measurements of the spectral phase such as wavelength scanning or white-light interferometry.