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Implications of Marcus−Hush Theory for Steady-State Heterogeneous Electron Transfer at an Inlaid Disk Electrode

机译:Marcus-Hush理论对镶嵌圆盘电极上稳态非均相电子转移的启示

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摘要

For an outer-sphere heterogeneous electron transfer, Oxne Red, between an electrode and a redox couple, thenButler Volmer formalism predicts that the operative het-nerogeneous rate constant, kred (cm s 1) for reduction (ornkox for oxidation) increases without limit as an exponen-ntial function of (E E0) for reduction (or (1 )(EnE0) for oxidation), where E is the applied electrodenpotential, (~1/2) is the transfer coefficient and E0 isnthe formal potential. The Marcus Hush formalism, asnexposited by Chidsey (Chidsey, C. E. D. Science 1991,n215, 919), predicts that the value of kred or kox limits atnsufficiently large values of (E E0)or(E E0). Thensteady-state currents at an inlaid disk electrode obtainednfor a redox species in solution were computed usingnboth formalisms with the Oldham Zoski approximationn(Oldham, K. B.; Zoski, C. G. J. Electroanal. Chem. 1988,n256, 11). Significant differences are noted for the twonformalisms.When k0r0/D is sufficiently small (k0 is thenstandard rate constant, r0 is the radius of the disknelectrode, and D is the diffusion coefficient of the redoxnspecies), the Marcus Hush formalism effects a limit-ning current that can be significantly smaller than thenmass transport limited current. This is easily explainednin terms of the limiting values of kred and kox predictednby the Marcus Hush formalism. The experimentalnconditions that must be met to effect significant differ-nences in behavior are discussed; experimental condi-ntions that effect virtually identical behavior are alsondiscussed. As a caveat for experimentalists, applica-ntions of the Butler Volmer formalism to systems thatnare more properly described using the Marcus Hushnformalism are shown to yield incorrect values of k0 andnmeaningless values of , which serves only as a fittingnparameter.
机译:对于电极和氧化还原对之间的外层异质电子转移Oxne Red,Butler Volmer形式主义预测,用于还原的有效异质速率常数kred(cm s 1)(用于氧化的ornkox)随温度的增加而不受限制(E E0)用于还原(或(1)(EnE0)用于氧化)的指数函数,其中E是施加的电势,(〜1/2)是转移系数,E0是形式势。由Chidsey(Chidsey,C. E. D. Science 1991,n215,919)异化的Marcus Hush形式主义预测kred或kox的值限制了(E E0)或(E E0)的足够大的值。然后使用两种形式主义与奥尔德姆Zoski近似值(Oldham,K.B .; Zoski,C.G.J.Electroanal.Chem.1988,n256,11)计算在溶液中为氧化还原物质获得的镶嵌圆盘电极上的稳态电流。注意到两种形式主义之间的显着差异。当k0r0 / D足够小时(k0是标准速率常数,r0是圆盘电极的半径,D是氧化还原物质的扩散系数),Marcus Hush形式主义会影响极限可以大大小于传输限制电流的电流。这很容易用Marcus Hush形式主义预测的kred和kox的极限值来解释。讨论了在行为上产生显着差异所必须满足的实验条件。还讨论了影响几乎相同行为的实验条件。作为对实验主义者的警告,巴特勒·沃尔默形式主义在使用Marcus Hushnformalism不能更恰当地描述的系统上的应用显示出产生了错误的k0值和无意义的,这仅用作拟合参数。

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  • 来源
    《Analytical Chemistry 》 |2010年第12期| p.5176-5183| 共8页
  • 作者

    Stephen W. Feldberg;

  • 作者单位

    Chemistry Department, Brookhaven National Laboratory, Upton, New York 11973-5000;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);美国《化学文摘》(CA);
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  • 正文语种 eng
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