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Epoxy-based aqueous-processable photodielectric dry film and conductive ViaPlug for PCB build-up and IC packaging

机译:环氧树脂基可水处理的光电介质干膜和导电性ViaPlug,用于PCB积层和IC封装

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摘要

DuPont formulated a new generation of photoimageable permanent resists and conductive ViaPlug polymer to be used as building blocks for sequential build-up of printed circuit boards (PCB's), multichip module-laminates (MCM-Ls), and plastic integrated circuit (IC) packages. The buzzwords for these structures are high density interconnection structures (HDIS) and microvias. The conventional method of making PCB's and MCM-Ls is a sequential lamination of innerlayer cores or interplanes, followed by at least one mechanical drilling. In this paper we will discuss a new approach of using semi-additive plating which means starting with a multilayer core, mechanically drilling for through hole connection, filling the through-hole with conductive ViaPlug, then adding layers of dielectric to make blind or buried vias for interconnection and routing of circuits, and heat dissipation. The paper will discuss the challenges in each application, relevant industry specifications for each application, and the dielectric and conductor materials properties to meet the challenges. From the viewpoint of technology choices, we will compare photoimaging versus laser ablation and plasma etching. Lastly, we will discuss our reliability data developed internally and in conjunction with several consortia.
机译:杜邦制定了新一代可光成像的永久抗蚀剂和导电性ViaPlug聚合物,用作顺序构建印刷电路板(PCB),多芯片模块层压板(MCM-Ls)和塑料集成电路(IC)封装的基础。这些结构的流行词是高密度互连结构(HDIS)和微孔。制造PCB和MCM-L的常规方法是依次层压内层芯或平面,然后至少进行一次机械钻孔。在本文中,我们将讨论使用半添加镀层的新方法,即从多层芯开始,机械钻孔以进行通孔连接,用导电ViaPlug填充通孔,然后添加电介质层以制作盲孔或掩埋通孔用于电路的互连和布线以及散热。本文将讨论每种应用所面临的挑战,每种应用的相关行业规格以及介电和导体材料的特性,以应对这些挑战。从技术选择的角度,我们将比较光成像与激光烧蚀以及等离子蚀刻。最后,我们将讨论内部以及与多个财团联合开发的可靠性数据。

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