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Electromagnetic-Thermal Characterization of on On-Chip Coupled (A)Symmetrical Interconnects

机译:片上耦合(A)对称互连的电磁热特性

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摘要

Based on several extended formulas to determine all frequency- and temperature-dependent distributed parameters of on-chip coupled asymmetrical and symmetrical interconnects on silicon substrates, the electromagnetic-thermal characteristics of interconnects were investigated in detail, including 1) wideband series impedances and shunt conductances, 2) conductive and dielectric attenuation constants of even( $c$) and odd $(pi)$ -mode, 3) pulse waveform distortion and crosstalk, and 4) average power handling capability (APHC). In these investigations, a set of modified formulas were proposed to determine the mutual conductance and capacitance of asymmetrical configuration. Appropriate thermal models were employed to evaluate the rise in temperature of metal interconnects, where the lateral heat dissipation was taken into account for different spacings between two interconnects. Parametric calculations were performed to capture the hybrid effects of all geometric and physical parameters of metal interconnects, such as line thickness, line conductivity, and silicon conductivity. All numerical examples are believed to be useful in the design of (a)symmetrical interconnects for digital and radio frequency circuits.
机译:基于确定硅衬底上片上耦合不对称和对称互连的所有频率和温度相关分布参数的扩展公式,详细研究了互连的电磁热特性,包括1)宽带串联阻抗和分流电导; 2)偶数($ c $)和奇数(pi)$模式的导电和介电衰减常数,3)脉冲波形失真和串扰,以及4)平均功率处理能力(APHC)。在这些研究中,提出了一组修改公式来确定不对称配置的互导和电容。采用适当的热模型评估金属互连的温度升高,其中考虑了两个互连之间不同间距的横向散热。进行参数计算以捕获金属互连的所有几何和物理参数(例如线宽,线电导率和硅电导率)的混合效应。相信所有数值示例都可用于设计数字和射频电路的(a)对称互连。

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