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Extending the Spectral Responsivity of MoS_2 Phototransistors by Incorporating Up-Conversion Microcrystals

机译:通过掺入上转换微晶来扩展MoS_2光电晶体管的光谱响应度

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摘要

Layered 2D semiconductors are characterized by unique photoelectric properties and, therefore, constitute a new class of basic building block for nextgeneration optoelectronics. However, their wide bandgaps limit the spectral responsivity to a narrow range. Here, a facile approach is demonstrated by integrating β-NaYF_4:Yb~(3+), Er~(3+) up-conversion microcrystals (UCMCs) with monolayer-MoS_2 phototransistors to break this bandgap-imposed barrier and to drastically extend the responsivity range. In essence, the UCMCs upconvert a near-infrared excitation at 980 nm to visible light of photons with energy matching the large bandgap (i.e., 1.8 eV) of monolayer-MoS_2, thereby activating the phototransistor with remarkable photocurrent and minimum interference. This approach leads to preservation of the excellent electrical merits of monolayer-MoS_2 and simultaneous retention of its low dark current and high photoresponsivity to the above-bandgap lights. Significantly, an enhancement by over 1000 times is achieved for both responsivity and specific detectivity at 980 nm excitation. Moreover, the rate of response is kept identical to that when the MoS_2 phototransistor is excited by a visible light. Therefore, integrating with UCMCs can enable the emerging 2D semiconductors of wide bandgap to respond to infrared excitations with high efficacy and without sacrificing their performance in the visible region.
机译:分层的2D半导体具有独特的光电特性,因此构成了下一代光电的一类新的基本构件。但是,它们的宽带隙将光谱响应度限制在一个狭窄的范围内。在这里,通过将β-NaYF_4:Yb〜(3 +),Er〜(3+)上转换微晶(UCMC)与单层MoS_2光电晶体管集成在一起,以打破该带隙施加的势垒并大幅扩展响应范围。本质上,UCMC将980 nm处的近红外激发光转换为具有与单层MoS_2的大带隙(即1.8 eV)相匹配的能量的光子可见光,从而以显着的光电流和最小的干扰来激活光电晶体管。这种方法可以保持单层MoS_2的优异电性能,并同时保留其低暗电流和对上述带隙光的高光响应性。值得注意的是,在980 nm激发下,响应度和比检测率均提高了1000倍以上。此外,响应速度保持与当MoS_2光电晶体管被可见光激发时的响应速度相同。因此,与UCMC集成可以使宽带隙的新兴2D半导体高效响应红外激发,而又不牺牲其在可见光区域的性能。

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  • 来源
    《Advanced Optical Materials》 |2018年第21期|1800660.1-1800660.7|共7页
  • 作者单位

    State Key Laboratory of ASIC and System School of Information Science and Technology Fudan University Shanghai 200433, China ,Solid-State Electronics The Ångström Laboratory Uppsala University SE-751 21 Uppsala, Sweden;

    State Key Laboratory of ASIC and System School of Information Science and Technology Fudan University Shanghai 200433, China;

    State Key Laboratory of ASIC and System School of Information Science and Technology Fudan University Shanghai 200433, China;

    State Key Laboratory of ASIC and System School of Information Science and Technology Fudan University Shanghai 200433, China;

    State Key Laboratory of ASIC and System School of Information Science and Technology Fudan University Shanghai 200433, China;

    State Key Laboratory of ASIC and System School of Information Science and Technology Fudan University Shanghai 200433, China;

    State Key Laboratory of ASIC and System School of Information Science and Technology Fudan University Shanghai 200433, China;

    State Key Laboratory of ASIC and System School of Information Science and Technology Fudan University Shanghai 200433, China;

    State Key Laboratory of ASIC and System School of Information Science and Technology Fudan University Shanghai 200433, China;

    Solid-State Electronics The Ångström Laboratory Uppsala University SE-751 21 Uppsala, Sweden;

    State Key Laboratory of ASIC and System School of Information Science and Technology Fudan University Shanghai 200433, China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    molybdenum disulfide; phototransistors; spectral responsivity; up-conversion;

    机译:二硫化钼光电晶体管;光谱响应度上转换;

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