Room-Temperature Nanoimprint Lithography of Non-thermoplastic Organic Films

摘要

Nanoimprint lithography (NIL) enables the transfer of master patterns fabricated by conventional lithographic techniques with very high fidelity by exploiting the glass transition of polymers. NIL uses a hard mold to cheaply imprint micro- and nanostructures onto large areas of the target compounds, without exposure to radiation, development, or etching processes. This technique has enabled the production of sub-100 nm structures on 6 in. (1 in. = 2.54 cm) wafers, nanoscale field-effect transistors,'4' metal-semiconductor-metal photodetectors, and three-dimensional patterns.