Controlled Growth of Large-Area High-Performance Small-Molecule Organic Single-Crystalline Transistors by Slot-Die Coating Using A Mixed Solvent System

摘要

The rapid development of organic material design and device processing has led to great progress for solution-processed organic field-effect transistors (OFETs). Although conventional vapor-deposited devices have higher performance than their solution-processed counterparts, low-cost large-area solution-processed high-performance devices still remain a challenge. Conventional solution-processed thin-film transistors fabricated by spin-coating or drop-casting methods cannot control the crystal growth behavior and crystal orientation to achieve high performance and large-area production. The control of crystal orientation and growth direction in channel regions has posed significant technical challenges. Therefore, many deposition techniques have been used for patterning and alignment of organic semiconductors. Among them, friction-transfer, rubbing alignment, photoalignment, magnetic alignment, Langmuir-Blodgett (LB), zone-casting, and solution-shearing techniques, etc., are promising to produce highly aligned thin films. However, most of these techniques are not suitable for convenient, large-area commercial production. Based on this consideration, a new deposition technique is still desirable for realizing industrial applications like roll-to-roll printing.