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首页> 外文期刊>Advanced Materials >Top-Down Patterning and Self-Assembly for Regular Arrays of Semiconducting Single-Walled Carbon Nanotubes
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Top-Down Patterning and Self-Assembly for Regular Arrays of Semiconducting Single-Walled Carbon Nanotubes

机译:自顶向下的图案化和自组装的规则阵列的半导体单壁碳纳米管。

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摘要

Single-walled carbon nanotubes (SWNTs) are promising nano-electronic materials, but they face one primary challenge to their integration into electronics: the variability of their structure and their sometimes semiconducting or metallic nature. Whether through their diameter and chirality ("twist") or their density and orientation, control over the type of carbon nanotubes and where they are placed is key to eventual integration into practical electronics. Several approaches have been proposed to control these disparate aspects. They can be divided into dry and wet methods and according to whether sorting and alignment occurs during growth or post-growth. Dry methods rely on either the preferential growth of semiconducting tubes over metallic ones (governed by chirality), or on the removal of metallic tubes from the tubes grown on substrates. Positional control can be achieved by aligned growth, either through directional flow during the chemical vapor deposition (CVD) process or along crystal axes. These techniques are nevertheless limited in both density and purity of semiconducting SWNTs (s-SWNTs), even with new techniques to transfer and stack CVD-grown tubes and to remove the remaining metallic tubes. Wet approaches rely on solution phase separation of the grown tubes, and have produced some very pure solutions of s-SWNTs, and in some cases, even examples of controlled chirality.However, fewer processes exist for control over the positioning of the SWNTs during deposition from solution. Dielectrophoresis is one technique that has been repeatedly and reproducibly used for the assembly of SWNTs, although it is limited in density to 50 tubes per micrometer. A self-assembly approach was used to place SWNTs in patterned trenches, but the SWNT alignment within the trench was poor and the process was intended to deposit one carbon nanotube per trench.The Langmuir-Blodgett and Lang-muir-Schaeffer methods have been used to align SWNTs on a substrate with full coverage, but the proximity of the SWNTs resulting from these methods is too close to avoid multilayers, which give screening effects between tubes. Our process results in 2D nanostructures consisting of individual carbon nanotubes (CNTs) or thin bundles that, while still subject to the screening that lowers performance in CNTs in close proximity, show substantially better performance on a per-CNT basis than stacked layers of nanotubes.
机译:单壁碳纳米管(SWNT)是有前途的纳米电子材料,但它们集成到电子学中面临一个主要挑战:其结构的可变性以及它们有时的半导体或金属性质。无论是通过直径和手性(“扭曲”)还是密度和取向,控制碳纳米管的类型及其放置位置都是最终集成到实际电子设备中的关键。已经提出了几种方法来控制这些不同的方面。根据生长或生长后是否进行分类和排列,可以将它们分为干法和湿法。干法依赖于半导体管相对于金属管的优先生长(通过手性控制),或者依赖于从生长在基板上的管中去除金属管。位置控制可以通过定向生长来实现,可以通过化学气相沉积(CVD)过程中的定向流或沿晶轴进行。尽管如此,这些技术在半导体SWNT(s-SWNT)的密度和纯度上都受到限制,即使采用新技术来转移和堆叠CVD生长的管并去除剩余的金属管也是如此。湿法依赖于生长管的溶液相分离,并产生了一些非常纯的s-SWNTs溶液,在某些情况下甚至产生了手性受控的例子,但是在沉积过程中控制SWNTs位置的过程较少从解决方案。尽管介电电泳的密度被限制在每微米50个试管中,但它已被重复和可复制地用于SWNT的组装。使用自组装方法将SWNT放置在图案化的沟槽中,但沟槽内的SWNT排列较差,该过程旨在在每个沟槽中沉积一个碳纳米管。已使用Langmuir-Blodgett和Lang-muir-Schaeffer方法不能完全覆盖基板上的单壁碳纳米管,但是这些方法产生的单壁碳纳米管的距离太近,无法避免多层结构,因为多层结构会在管之间产生屏蔽效果。我们的过程产生了由单个碳纳米管(CNT)或细束组成的2D纳米结构,尽管仍然受到筛选,降低了CNT的性能,但在逐个CNT的基础上,其性能要比纳米管的堆叠层好得多。

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  • 来源
    《Advanced Materials》 |2014年第35期|6151-6156|共6页
  • 作者单位

    Department of Chemistry and Laboratory for Advanced Materials Stanford University Stanford, CA 94305, USA;

    Department of Chemistry and Laboratory for Advanced Materials Stanford University Stanford, CA 94305, USA;

    Department of Chemistry and Laboratory for Advanced Materials Stanford University Stanford, CA 94305, USA;

    Department of Chemistry and Laboratory for Advanced Materials Stanford University Stanford, CA 94305, USA;

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