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首页> 外文期刊>Advanced Functional Materials >Polymer Field-Effect Transistors Fabricated by the Sequential Gravure Printing of Polythiophene, Two Insulator Layers, and a Metal Ink Gate
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Polymer Field-Effect Transistors Fabricated by the Sequential Gravure Printing of Polythiophene, Two Insulator Layers, and a Metal Ink Gate

机译:聚噻吩,两个绝缘层和一个金属油墨门的顺序凹版印刷制造的聚合物场效应晶体管

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摘要

The mass production technique of gravure contact printing is used to fabricate state-of-the art polymer field-effect transistors (FETs). Using plastic substrates with prepattemed indium tin oxide source and drain contacts as required for display applications, four different layers are sequentially gravureprinted: the semiconductor poly(3-hexylthiophene-2,5-diyl) (P3HT), two insulator layers, and an Ag gate. A crosslinkable insulator and an Ag ink are developed which are both printable and highly robust. Printing in ambient and using this bottom-contact/top-gate geometry, an on/off ratio of >10~4 and a mobility of 0.04 cm~2 V~(-1) s~(-1) are achieved. This rivals the best top-gate polymer FETs fabricated with these materials. Printing using low concentration, low viscosity ink formulations, and different P3HT molecular weights is demonstrated. The printing speed of 40 m min~(-1) on a flexible polymer substrate demonstrates that very high-volume, reel-to-reel production of organic electronic devices is possible.
机译:凹版接触印刷的批量生产技术用于制造最先进的聚合物场效应晶体管(FET)。使用显示应用所需的带预图案化铟锡氧化物源极和漏极触点的塑料基板,依次对四个不同的层进行凹版印刷:半导体聚(3-己基噻吩-2,5-二基)(P3HT),两个绝缘体层和一个Ag门。开发了可印刷且高度坚固的可交联绝缘体和Ag油墨。在环境中进行印刷并使用这种底部接触/顶部浇口几何形状,可以实现> 10〜4的开/关比和0.04 cm〜2 V〜(-1)s〜(-1)的迁移率。这可以与用这些材料制成的最佳顶栅聚合物FET媲美。演示了使用低浓度,低粘度墨水配方和不同P3HT分子量的印刷。在柔性聚合物基板上的40 m min〜(-1)的印刷速度表明,有机电子器件的批量生产非常可能。

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  • 来源
    《Advanced Functional Materials 》 |2010年第2期| 239-246| 共8页
  • 作者单位

    Experimental Solid State Croup and the Centre for Plastic Electronics, Department of Physics Imperial College London, The Blackett Laboratory South Kensington Campus, London SW7 2AZ (UK);

    Experimental Solid State Croup and the Centre for Plastic Electronics, Department of Physics Imperial College London, The Blackett Laboratory South Kensington Campus, London SW7 2AZ (UK);

    Experimental Solid State Croup and the Centre for Plastic Electronics, Department of Physics Imperial College London, The Blackett Laboratory South Kensington Campus, London SW7 2AZ (UK);

    Experimental Solid State Croup and the Centre for Plastic Electronics, Department of Physics Imperial College London, The Blackett Laboratory South Kensington Campus, London SW7 2AZ (UK);

    Experimental Solid State Croup and the Centre for Plastic Electronics, Department of Physics Imperial College London, The Blackett Laboratory South Kensington Campus, London SW7 2AZ (UK);

    Experimental Solid State Croup and the Centre for Plastic Electronics, Department of Physics Imperial College London, The Blackett Laboratory South Kensington Campus, London SW7 2AZ (UK);

    Department of Chemistry, Imperial College London South Kensington Campus, London SW7 2AY (UK) GE (China), Research Development Center Co. Ltd., 1800 Cailun Road, Zhangjang Hightech Park, Pudong District, Shanghai 201203, P. R. China;

    Department of Chemistry, Imperial College London South Kensington Campus, London SW7 2AY (UK);

    Merck Chemicals, Chilworth Science Park Southampton SO16 7QD (UK);

    Merck Chemicals, Chilworth Science Park Southampton SO16 7QD (UK) Department of Chemistry, Imperial College of Science, Technology and Medicine, South Kensington, London SW7 2AY, UK;

    Institute for Material Research, Hasselt University Division IMOMEC/IMEC Wetenscharpspark 1, 3590 Diepenbeck (Belgium);

    Institute for Material Research, Hasselt University Division IMOMEC/IMEC Wetenscharpspark 1, 3590 Diepenbeck (Belgium);

    Institute for Material Research, Hasselt University Division IMOMEC/IMEC Wetenscharpspark 1, 3590 Diepenbeck (Belgium) Laboratory of Chemistry for Novel Materials, Materia Nova, Avenue Nicolas Copernic 1, 7000 Mons, Belgium;

    Institute for Material Research, Hasselt University Division IMOMEC/IMEC Wetenscharpspark 1, 3590 Diepenbeck (Belgium);

    Technische Universitaet llmenau PO Box 100 565, 98684 llmenau (Germany);

    Technische Universitaet llmenau PO Box 100 565, 98684 llmenau (Germany);

    Technische Universitaet llmenau PO Box 100 565, 98684 llmenau (Germany);

    Norbert Schlaefli Maschinen Muehletalstr. 69, 4800 Zofingen (Switzerland);

    Swatch Group R&D SA - Asulab Rue des Sors 3, 2074 Marin (Switzerland);

    Swatch Group R&D SA - Asulab Rue des Sors 3, 2074 Marin (Switzerland);

    Swatch Group R&D SA - Asulab Rue des Sors 3, 2074 Marin (Switzerland);

    Swatch Group R&D SA - Asulab Rue des Sors 3, 2074 Marin (Switzerland);

    IC Consultants Ltd, 58 Prince's Gate Exhibition Road, London, SW7 2PG (UK);

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