...
首页> 外文期刊>Advanced Functional Materials >High-Performance Top-Gated Organic Field-Effect Transistor Memory using Electrets for Monolithic Printed Flexible NAND Flash Memory
【24h】

High-Performance Top-Gated Organic Field-Effect Transistor Memory using Electrets for Monolithic Printed Flexible NAND Flash Memory

机译:使用驻极体的高性能顶栅有机场效应晶体管存储器,用于整体印刷柔性NAND闪存

获取原文
获取原文并翻译 | 示例
   

获取外文期刊封面封底 >>

       

摘要

High-performance top-gated organic field-effect transistor (OFET) memory devices using electrets and their applications to flexible printed organic NAND flash are reported. The OFETs based on an inkjet-printed p-type polymer semiconductor with efficiently chargeable dielectric poly(2-vinylnaph-thalene) (PVN) and high-k blocking gate dielectric poly(vinylidenefluoride-trifluoroethylene) (P(VDF-TVFE)) shows excellent non-volatile memory characteristics. The superior memory characteristics originate mainly from reversible charge trapping and detrapping in the PVN electret layer efficiently in low-k/high-k bilayered dielectrics. A strategy is devised for the successful development of monolithicaliy inkjet-printed flexible organic NAND flash memory through the proper selection of the polymer electrets (PVN or PS), where PVN/- and PS/P(VDF-TrFE) devices are used as non-volatile memory cells and ground- and bit-line select transistors, respectively. Electrical simulations reveal that the flexible printed organic NAND flash can be possible to program, read, and erase all memory cells in the memory array repeatedly without affecting the non-selected memory cells.
机译:报告了使用驻极体的高性能顶栅有机场效应晶体管(OFET)存储器件及其在柔性印刷有机NAND闪存中的应用。基于喷墨印刷的p型聚合物半导体的OFET具有有效充电的介电聚(2-乙烯基萘-thalene)(PVN)和高k阻挡栅介电聚偏二氟乙烯-三氟乙烯(P(VDF-TVFE))优异的非易失性存储特性。优异的存储特性主要源于在低k /高k双层电介质中有效地在PVN驻极体层中进行可逆的电荷俘获和去俘获。通过适当选择聚合物驻极体(PVN或PS),设计了一种成功开发单片喷墨印刷的柔性有机NAND闪存的策略,其中PVN /-和PS / P(VD​​F-TrFE)器件用作非驻极体-易失性存储单元以及地线和位线选择晶体管。电气仿真表明,柔性印刷有机NAND闪存可以重复编程,读取和擦除存储阵列中的所有存储单元,而不会影响未选择的存储单元。

著录项

  • 来源
    《Advanced Functional Materials》 |2012年第14期|p.2915-2926|共12页
  • 作者单位

    Convergence Components and Materials Research Laboratory Electronics and Telecommunications Research Institute (ETRI) 218 Cajeongno, Yuseong-gu, Daejeon 305-700, Republic of Korea,Department of Chemistry, Northwestern University 2145 Sheridan Road, Evanston, IL 60208, USA;

    Heeger Center for Advanced Materials School of Materials Science and Engineering Gwangju Institute of Science and Technology (GIST) 261 Cheomdan-gwagiro, Buk-gu Gwangju 500-712, Republic of Korea;

    Heeger Center for Advanced Materials School of Materials Science and Engineering Gwangju Institute of Science and Technology (GIST) 261 Cheomdan-gwagiro, Buk-gu Gwangju 500-712, Republic of Korea;

    College of Electrical and Computer Engineering Department of Electronics Engineering Chungbuk National University 410 Seongbong-ro, Heungduk-gu Cheongju, Chungbuk, 361-76, Republic of Korea;

    Heeger Center for Advanced Materials School of Materials Science and Engineering Gwangju Institute of Science and Technology (GIST) 261 Cheomdan-gwagiro, Buk-gu Gwangju 500-712, Republic of Korea;

    Convergence Components and Materials Research Laboratory Electronics and Telecommunications Research Institute (ETRI) 218 Cajeongno, Yuseong-gu, Daejeon 305-700, Republic of Korea;

    Convergence Components and Materials Research Laboratory Electronics and Telecommunications Research Institute (ETRI) 218 Cajeongno, Yuseong-gu, Daejeon 305-700, Republic of Korea;

    Heeger Center for Advanced Materials School of Materials Science and Engineering Gwangju Institute of Science and Technology (GIST) 261 Cheomdan-gwagiro, Buk-gu Gwangju 500-712, Republic of Korea;

    Department of Chemical Engineering Hanbat National University San 16-1, Dukmyung-dong, Yuseong-gu Daejeon 305-719 Republic of Korea;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号