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Impact of Bi Deficiencies on Ferroelectric Resistive Switching Characteristics Observed at p-Type Schottky-Like Pt/Bi_(1-δ)FeO_3 Interfaces

机译:Bi缺陷对在p型肖特基Pt / Bi_(1-δ)FeO_3接口处观察到的铁电电阻开关特性的影响

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摘要

This work reports a resistive switching effect observed at rectifying Pt/ Bi_(1-δ)FeO_3 interfaces and the impact of Bi deficiencies on its characteristics. Since Bi deficiencies provide hole carriers in BiFeO_3, Bi-deficient Bi_(1-δ)FeO_3 films act as a p-type semiconductor. As the Bi deficiency increased, a leakage current at Pt/Bi_(1-δ)FeO_3 interfaces tended to increase, and finally, rectifying and hysteretic current-voltage (I-V) characteristics were observed. In I-V characteristics measured at a voltage-sweep frequency of 1 kHz, positive and negative current peaks originating from ferroelectric displacement current were observed under forward and reverse bias prior to set and reset switching processes, respectively, suggesting that polarization reversal is involved in the resistive switching effect. The resistive switching measurements in a pulse-voltage mode revealed that the switching speed and switching ratio can be improved by controlling the Bi deficiency. The resistive switching devices showed endurance of >10~5 cycles and data retention of >10~5 s at room temperature. Moreover, unlike conventional resistive switching devices made of metal oxides, no forming process is needed to obtain a stable resistive switching effect in the ferroelectric resistive switching devices. These results demonstrate promising prospects for application of the ferroelectric resistive switching effect at Pt/Bi_(1-δ)FeO_3 interfaces to nonvolatile memory.
机译:这项工作报告了在校正Pt / Bi_(1-δ)FeO_3界面时观察到的电阻性开关效应,以及Bi缺陷对其特性的影响。由于Bi缺陷会在BiFeO_3中提供空穴载流子,因此Bi缺陷的Bi_(1-δ)FeO_3薄膜会充当p型半导体。随着Bi缺陷的增加,Pt / Bi_(1-δ)FeO_3界面处的泄漏电流趋于增加,最后观察到整流和迟滞电流-电压(I-V)特性。在以1 kHz的扫频频率测量的IV特性中,在置位和复位开关过程之前,在正向和反向偏置下分别观察到源自铁电位移电流的正向和负向电流峰值,这表明电阻性极化涉及反向极化。开关效果。脉冲电压模式下的电阻开关测量表明,通过控制Bi缺陷可以提高开关速度和开关比。电阻式开关器件在室温下的耐力> 10〜5个周期,数据保持> 10〜5s。此外,与由金属氧化物制成的常规电阻式开关器件不同,不需要形成工艺来在铁电电阻式开关器件中获得稳定的电阻式开关效果。这些结果证明了在Pt / Bi_(1-δ)FeO_3接口上将铁电电阻开关效应应用于非易失性存储器的前景广阔。

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  • 来源
    《Advanced Functional Materials》 |2012年第5期|p.1040-1047|共8页
  • 作者单位

    National Institute of Advanced Industrial Science and Technology (AIST)Tsukuba, Ibaraki 305-8562 Japan;

    National Institute of Advanced Industrial Science and Technology (AIST)Tsukuba, Ibaraki 305-8562 Japan;

    National Institute of Advanced Industrial Science and Technology (AIST)Tsukuba, Ibaraki 305-8562 Japan;

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