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Influence of a Single Grain Boundary on Domain Wall Motion in Ferroelectrics

机译:单晶边界对铁电畴壁运动的影响

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摘要

axial tetragonal 425 and 611 nm thick Pb(Zr_(0.45)Ti_(0.55))O_3 (PZT) films are deposited by pulsed laser deposition on SrRuO3-coated (100) SrTiO_3 24° tilt angle bicrystal substrates to create a single PZT grain boundary with a well-defined orientation. On either side of the bicrystal boundary, the films show square hysteresis loops and have dielectric permittivities of 456 and 576, with loss tangents of 0.010 and 0.015, respectively. Using piezoresponse force microscopy (PFM), a decrease in the nonlinear piezoelectric response is observed in the vicinity (720-820 nm) of the grain boundary. This region represents the width over which the extrinsic contributions to the piezoelectric response (e.g., those associated with the domain density/configuration and/or the domain wall mobility) are influenced by the presence of the grain boundary. Transmission electron microscope (TEM) images collected near and far from the grain boundary indicate a strong preference for (101)/(101) type domain walls at the grain boundary, whereas (011)/(011) and (101)/(101) are observed away from this region. It is proposed that the elastic strain field at the grain boundary interacts with the ferro-electric/elastic domain structure, stabilizing (101)/(101) rather than (011)/(0ll) type domain walls, which inhibits domain wall motion under applied field and decreases non-linearity.
机译:轴向四方425和611 nm厚的Pb(Zr_(0.45)Ti_(0.55))O_3(PZT)膜通过脉冲激光沉积在SrRuO3涂层(100)SrTiO_3 24°倾斜角双晶衬底上沉积以创建单个PZT晶界具有明确定义的方向。在双晶边界的任一侧,这些膜都显示出方形磁滞回线,介电常数为456和576,损耗角正切分别为0.010和0.015。使用压电响应力显微镜(PFM),可以在晶界附近(720-820 nm)观察到非线性压电响应的降低。该区域表示宽度,在该宽度上,晶粒边界的存在对压电响应的外在贡献(例如,与畴密度/构型和/或畴壁迁移率相关的贡献)受到影响。靠近和远离晶界收集的透射电子显微镜(TEM)图像表明,在晶界处强烈偏爱(101)/(101)型畴壁,而(011)/(011)和(101)/(101) )远离此区域。建议在晶界处的弹性应变场与铁电/弹性畴结构相互作用,稳定(101)/(101)而不是(011)/(0ll)型畴壁,从而抑制了畴壁运动。施加磁场并降低非线性。

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  • 来源
    《Advanced Functional Materials》 |2014年第10期|1409-1417|共9页
  • 作者单位

    Department of Materials Science and Engineering and Materials Research Institute The Pennsylvania State University University Park, PA, 16802, USA;

    Department of Materials Science and Engineering University of Sheffield Sheffield, S13JD, UK;

    The Center for Nanophase Materials Sciences Oak Ridge National Laboratory Oak Ridge, TN, 37831, USA;

    The Center for Nanophase Materials Sciences Oak Ridge National Laboratory Oak Ridge, TN, 37831, USA;

    The Center for Nanophase Materials Sciences Oak Ridge National Laboratory Oak Ridge, TN, 37831, USA;

    Department of Materials Science and Engineering University of Sheffield Sheffield, S13JD, UK;

    Department of Materials Science and Engineering University of Sheffield Sheffield, S13JD, UK;

    Department of Materials Science and Engineering and Materials Research Institute The Pennsylvania State University University Park, PA, 16802, USA;

    Department of Materials Science and Engineering and Materials Research Institute The Pennsylvania State University University Park, PA, 16802, USA;

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