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首页> 外文期刊>Advanced Functional Materials >Formation of a Quasi-Free-Standing Single Layer of Graphene and Hexagonal Boron Nitride on Pt(111) by a Single Molecular Precursor
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Formation of a Quasi-Free-Standing Single Layer of Graphene and Hexagonal Boron Nitride on Pt(111) by a Single Molecular Precursor

机译:通过单个分子前体在Pt(111)上形成石墨烯和六方氮化硼的准无固定单层

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摘要

It is shown that on Pt(111) it is possible to prepare hexagonal boron nitride (h -BN) and graphene (G) in-plane heterojunctions from a single molecular precursor, by thermal decomposition of dimethylamine borane (DMAB). Photoemission, near-edge X-ray absorption spectroscopy, low energy electron microscopy, and temperature programmed desorption measurements indicate that the layer fully covers the Pt(111) surface. Evidence of in-plane layer continuity and weak interaction with Pt substrate has been established. The findings demonstrate that dehydrogenation and pyrolitic decomposition of DMAB is an efficient and easy method for obtaining a continuous almost freestanding layer mostly made of G, h -BN with only a low percentage (< 3%) of impurities (B and N-doped G domains or C-doped h -BN or boron carbonitride, BCN at the boundaries) in the same 2D sheet on a metal substrate, such as Pt(111), paving the way for the advancement of next-generation G-like-based electronics and novel spintronic devices.
机译:结果表明,在Pt(111)上,可以通过二甲胺硼烷(DMAB)的热分解从单个分子前体制备六方氮化硼(h -BN)和石墨烯(G)面内异质结。光发射,近边缘X射线吸收光谱,低能电子显微镜和程序升温脱附测量表明该层完全覆盖了Pt(111)表面。已经建立了平面内层连续性和与Pt衬底的弱相互作用的证据。研究结果表明,DMAB的脱氢和热解分解是一种高效,简便的方法,可得到连续的几乎独立的层,主要由G,h -BN组成,且杂质(B和N掺杂的G含量低)(<3%)域或C掺杂的h -BN或碳氮化硼,边界处的BCN)在金属基材(例如Pt(111))上的同一2D薄板中,为下一代基于G的电子产品的发展铺平了道路和新颖的自旋电子器件。

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  • 来源
    《Advanced Functional Materials 》 |2016年第7期| 1120-1126| 共7页
  • 作者单位

    IOM CNR Lab TASC, I-34149 Basovizza, TS, Italy;

    Elettra Sincrotrone Trieste SCpA, I-34149 Basovizza, TS, Italy;

    Elettra Sincrotrone Trieste SCpA, I-34149 Basovizza, TS, Italy;

    Elettra Sincrotrone Trieste SCpA, I-34149 Basovizza, TS, Italy;

    Univ Padua, Dept Chem Sci, I-35131 Padua, Italy;

    Univ Padua, Dept Chem Sci, I-35131 Padua, Italy;

    IOM CNR Lab TASC, I-34149 Basovizza, TS, Italy;

    IOM CNR Lab TASC, I-34149 Basovizza, TS, Italy|Univ Johannesburg, Dept Phys, POB 524, ZA-2006 Auckland Pk, South Africa;

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