...
首页> 外文期刊>Advanced Functional Materials >2D Group IVB Transition Metal Dichalcogenides
【24h】

2D Group IVB Transition Metal Dichalcogenides

机译:2D IVB组过渡金属硫属元素化物

获取原文
获取原文并翻译 | 示例

摘要

Semiconductor technology is currently impaired by the surface dangling bond of materials, which introduces scattering and interface traps. 2D materials, especially transition metal dichalcogenides (TMDs) with different main groups, have settled this issue by utilizing unique atomically smooth surfaces and van der Waals (vdW) structures. Over the past few decades, many processes for exploring new materials, manipulating physical properties, and synthesizing single crystals have been developed. Among these 2D materials, group IVB TMDs are distinguished for their splendid physical properties, including ultrahigh mobility, charge density wave, superconducting transitions, etc. Here, the recent advances in group IVB TMDs are reviewed, which offer easy access to next generation nano-, opto-, thermal-electronic, energy storage and conversion applications. Both the advantages and challenges of these studies are summarized to further clarify existing problems.
机译:材料的表面悬空键目前会损害半导体技术,这会导致散射和界面陷阱。二维材料,尤其是具有不同主要基团的过渡金属二硫化碳(TMD),已经通过利用独特的原子光滑表面和范德华(vdW)结构解决了这一问题。在过去的几十年中,已经开发了许多探索新材料,操纵物理性能以及合成单晶的方法。在这些2D材料中,IVB组TMD具有出色的物理性能,包括超高迁移率,电荷密度波,超导转变等。在这里,本文对IVB组TMD的最新进展进行了综述,它们使人们可以轻松访问下一代纳米级。 ,光电,热电子,能量存储和转换应用。总结了这些研究的优点和挑战,以进一步阐明存在的问题。

著录项

  • 来源
    《Advanced Functional Materials 》 |2018年第39期| 1803305.1-1803305.18| 共18页
  • 作者单位

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;

    Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China;

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;

    Huazhong Univ Sci & Technol, Sch Mat Sci & Engn, State Key Lab Mat Proc & Die & Mould Technol, Wuhan 430074, Hubei, Peoples R China;

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    charge density waves; group IVB TMDs; nanoelectronic applications; ultrahigh mobility;

    机译:电荷密度波IVB族TMDs纳米电子应用超高迁移率;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号