...
首页> 外文期刊>Advanced Functional Materials >High Thermoelectric Performance Achieved in GeTe-Bi_2Te_3 Pseudo-Binary via Van der Waals Gap-Induced Hierarchical Ferroelectric Domain Structure
【24h】

High Thermoelectric Performance Achieved in GeTe-Bi_2Te_3 Pseudo-Binary via Van der Waals Gap-Induced Hierarchical Ferroelectric Domain Structure

机译:通过范德华间隙诱导的分层铁电畴结构在GeTe-Bi_2Te_3伪二元体系中获得高热电性能

获取原文
获取原文并翻译 | 示例
           

摘要

GeTe is an interesting material presenting both spontaneous polarization (ferroelectrics) and outstanding electrical conductivity (ideal for thermoelectrics). Pristine GeTe exhibits classic 71 degrees and 109 degrees submicron ferroelectric domains, and near unity thermoelectric figure of merit ZT at 773 K. In this work, it is demonstrated that Bi2Te3 alloying in GeTe lattice can introduce vast Ge vacancies which can further evolve into nanoscale van der Waals gaps upon proper heat treatment, and that these vacancy gaps can induce 180 degrees nanoscale ferroelectric domain boundaries. These microstructures eventually become a hierarchical ferroelectric domain structure, with size varying from submicron to nanoscale and polarization from 71 degrees, 109 degrees to 180 degrees. The establishment of hierarchical ferroelectric domain structure, together with the nanoscale Ge vacancy van der Waals gaps, has profound effects on the electrical and thermal transport properties, resulting in a striking peak thermoelectric ZT approximate to 2.4 at 773 K. These findings might provide an alternative conception for thermoelectric optimization via microstructure modulation.
机译:GeTe是一种有趣的材料,具有自发极化(铁电)和出色的导电性(理想用于热电)的特性。原始的GeTe具有经典的71度和109度亚微米铁电畴,在773 K处具有接近统一的热电品质因数ZT。这项工作表明,GeTe晶格中的Bi2Te3合金化可以引入大量的Ge空位,这些空位可以进一步演化为纳米级范经过适当热处理后的der Waals间隙,并且这些空位间隙可诱发180度纳米级铁电畴边界。这些微结构最终成为分层的铁电畴结构,尺寸从亚微米到纳米不等,极化范围从71度,109度到180度。建立分层铁电畴结构以及纳米级Ge空位范德华间隙对电和热输运性质产生深远影响,从而在773 K处产生惊人的峰值热电ZT约2.4。这些发现可能提供了另一种选择通过微结构调制进行热电优化的概念。

著录项

  • 来源
    《Advanced Functional Materials》 |2019年第18期|1806613.1-1806613.10|共10页
  • 作者

    Wu Di; Xie Lin; Xu Xiao; He Jiaqing;

  • 作者单位

    Southern Univ Sci & Technol, Dept Phys, Shenzhen 518055, Peoples R China|Shaanxi Normal Univ, Key Lab Macromol Sci Shaanxi Prov, Sch Mat Sci & Engn, Xian 710119, Shaanxi, Peoples R China;

    Southern Univ Sci & Technol, Dept Phys, Shenzhen 518055, Peoples R China;

    Southern Univ Sci & Technol, Dept Phys, Shenzhen 518055, Peoples R China;

    Southern Univ Sci & Technol, Dept Phys, Shenzhen 518055, Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    domain boundaries; ferroelectric; GeTe; thermoelectrics; van der Waals gaps;

    机译:畴边界;铁电;GeTe;热电学;范德华间隙;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号