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Many-to-many comprehensive relative importance analysis and its applications to analysis of semiconductor electrical testing parameters

机译:多对多综合相对重要的分析及其在半导体电气测试参数分析中的应用

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摘要

Most engineering systems have multiple inputs and multiple outputs. For example, a semiconductor manufacturing system consists of thousands of fabrication steps with numerous inline production parameters affecting multiple electrical characteristics of final chips. Many-to-many analysis is thus needed to more effectively discover critical factors causing poor product qualities or a low production yield. Though methodologies of many-to-many correlation analysis have been proposed in the literature, difficulties arise, especially when there exist multicollinearity effects among features, to measure the relative importance of a feature's contribution. Relative weight analysis offers a general framework for determining the relative importance of features in multiple linear regression models. In this article, we propose a many-to-many comprehensive relative importance analysis based on canonical correlation analysis to effectively summarize the relationship between two sets of features. Simulation and actual semiconductor yield-analysis cases are used to show the proposed method, as compared to other conventional methods, in analysis of two sets of features.
机译:大多数工程系统都有多个输入和多个输出。例如,半导体制造系统由数千个制造步骤组成,具有影响最终芯片多电气特性的许多内联生产参数。因此需要多对多的分析来更有效地发现引起产品质量差或产量低的关键因素。虽然在文献中提出了多对多相关分析的方法,但出现了困难,特别是当在特征之间存在多元性效应时,衡量特征贡献的相对重要性。相对权重分析提供了一种用于确定多元线性回归模型中特征的相对重要性的一般框架。在本文中,我们提出了基于规范相关分析的多对多综合相对重要性分析,以有效地总结两组特征之间的关系。与其他传统方法相比,模拟和实际半导体产量分析壳体用于显示两组特征的分析。

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