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首页> 外文期刊>Advanced energy materials >Weak Electron Phonon Coupling and Deep Level Impurity for High Thermoelectric Performance Pb_(1−x)Ga_xTe
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Weak Electron Phonon Coupling and Deep Level Impurity for High Thermoelectric Performance Pb_(1−x)Ga_xTe

机译:高热电性能Pb_(1-x)Ga_xTe的弱电子声子耦合和深能级杂质

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摘要

High ZT of 1.34 at 766 K and a record high average ZT above 1 in the temperature range of 300-864 K are attained in n-type PbTe by engineering the temperature-dependent carrier concentration and weakening electron-phonon coupling upon Ga doping. The experimental studies and first principles band structure calculations show that doping with Ga introduces a shallow level impurity contributing extrinsic carriers and imparts a deeper impurity level that ionizes at higher temperatures. This adjusts the carrier concentration closer to the temperature-dependent optimum and thus maximizes the power factor in a wide temperature range. The maximum power factor of 35 mu W cm(-1) K-2 is achieved for the Pb0.98Ga0.02Te compound, and is maintained over 20 mu Wcm(-1) K-2 from 300 to 767 K. Band structure calculations and X-ray photoelectron spectroscopy corroborate the amphoteric role of Ga in PbTe as the origin of shallow and deep levels. Additionally, Ga doping weakens the electron-phonon coupling, leading to high carrier mobilities in excess of 1200 cm(2) V-1 s(-1). Enhanced point defect phonon scattering yields a reduced lattice thermal conductivity. This work provides a new avenue, beyond the conventional shallow level doping, for further improving the average ZT in thermoelectric materials.
机译:通过对温度相关的载流子浓度进行工程设计并在Ga掺杂时弱化电子-声子耦合,可以在n型PbTe中获得766 K时的1.34的高ZT和300-864 K的温度范围内高于1的创纪录高平均ZT。实验研究和第一性原理的能带结构计算表明,掺杂Ga会引入杂质外源载流子的浅能级杂质,并能在高温下产生更深的离子化能级。这将载流子浓度调整到更接近于温度的最佳值,从而在较宽的温度范围内使功率因数最大化。 Pb0.98Ga0.02Te化合物可实现35μW cm(-1)K-2的最大功率因数,并在300至767 K范围内保持在20μWcm(-1)K-2之上。能带结构计算X射线光电子能谱证实了Ga在PbTe中作为浅层和深层起源的两性作用。此外,Ga掺杂会削弱电子-声子耦合,导致高载流子迁移率超过1200 cm(2)V-1 s(-1)。增强的点缺陷声子散射会降低晶格热导率。这项工作提供了超越常规浅层掺杂的新途径,以进一步提高热电材料中的平均ZT。

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  • 来源
    《Advanced energy materials》 |2018年第21期|1800659.1-1800659.11|共11页
  • 作者单位

    Wuhan Univ Technol, State Key Lab Adv Technol Mat Synth & Proc, Wuhan 430070, Hubei, Peoples R China;

    Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA;

    Univ Michigan, Dept Phys, Ann Arbor, MI 48109 USA;

    Wuhan Univ Technol, State Key Lab Adv Technol Mat Synth & Proc, Wuhan 430070, Hubei, Peoples R China;

    Northwestern Univ, Dept Chem, 2145 Sheridan Rd, Evanston, IL 60208 USA;

    Northwestern Univ, Dept Chem, 2145 Sheridan Rd, Evanston, IL 60208 USA;

    Northwestern Univ, Dept Chem, 2145 Sheridan Rd, Evanston, IL 60208 USA;

    Wuhan Univ Technol, State Key Lab Adv Technol Mat Synth & Proc, Wuhan 430070, Hubei, Peoples R China;

    Univ Michigan, Dept Phys, Ann Arbor, MI 48109 USA;

    Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA;

    Wuhan Univ Technol, State Key Lab Adv Technol Mat Synth & Proc, Wuhan 430070, Hubei, Peoples R China;

    Northwestern Univ, Dept Chem, 2145 Sheridan Rd, Evanston, IL 60208 USA;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    deep level impurities; Ga doping; PbTe; thermoelectric properties;

    机译:深能级杂质Ga掺杂PbTe热电性能;

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