首页> 美国卫生研究院文献>Nanoscale Research Letters >Purification/annealing of graphene with 100-MeV Ag ion irradiation
【2h】

Purification/annealing of graphene with 100-MeV Ag ion irradiation

机译:100MeV Ag离子辐照对石墨烯的纯化/退火

代理获取
本网站仅为用户提供外文OA文献查询和代理获取服务,本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文,但由于OA文献来源多样且变更频繁,仍可能出现获取不到、文献不完整或与标题不符等情况,如果获取不到我们将提供退款服务。请知悉。

摘要

Studies on interaction of graphene with radiation are important because of nanolithographic processes in graphene-based electronic devices and for space applications. Since the electronic properties of graphene are highly sensitive to the defects and number of layers in graphene sample, it is desirable to develop tools to engineer these two parameters. We report swift heavy ion (SHI) irradiation-induced annealing and purification effects in graphene films, similar to that observed in our studies on fullerenes and carbon nanotubes (CNTs). Raman studies after irradiation with 100-MeV Ag ions (fluences from 3 × 1010 to 1 × 1014 ions/cm2) show that the disorder parameter α, defined by ID/IG ratio, decreases at lower fluences but increases at higher fluences beyond 1 × 1012 ions/cm2. This indicates that SHI induces annealing effects at lower fluences. We also observe that the number of graphene layers is reduced at fluences higher than 1 × 1013 ions/cm2. Using inelastic thermal spike model calculations, we estimate a radius of 2.6 nm for ion track core surrounded by a halo extending up to 11.6 nm. The transient temperature above the melting point in the track core results in damage, whereas lower temperature in the track halo is responsible for annealing. The results suggest that SHI irradiation fluence may be used as one of the tools for defect annealing and manipulation of the number of graphene layers.PACS60.80.x; 81.05.ue
机译:石墨烯与辐射相互作用的研究非常重要,这是因为基于石墨烯的电子设备中的纳米光刻工艺以及空间应用。由于石墨烯的电子性质对石墨烯样品中的缺陷和层数高度敏感,因此需要开发工具来设计这两个参数。我们报告了石墨烯薄膜中重离子(SHI)的快速辐照诱导的退火和纯化作用,这与我们对富勒烯和碳纳米管(CNT)的研究相似。用100MeV Ag离子辐照(从3×(10 10 到1×10 14 离子/ cm 2 )的拉曼研究表明: ID / IG比定义的无序参数α在低于1×10 12 离子/ cm 2 时,通量较低时降低,而通量较高时则增加。这表明SHI以较低的通量诱导退火效果。我们还观察到,注量高于1×10 13 离子/ cm 2 时,石墨烯层的数量减少。使用非弹性热尖峰模型计算,我们估计离子轨道芯的半径为2.6 nm,周围被延伸至11.6 nm的光环包围。磁道芯中熔点以上的瞬态温度会导致损坏,而磁道晕中的较低温度负责退火。结果表明,SHI辐照通量可以用作缺陷退火和石墨烯层数控制的工具之一。PACS60.80.x; 81.05.ue

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
代理获取

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号