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Likelihood of atom–atom contacts in crystal structures of halogenated organic compounds

机译:卤代有机化合物晶体结构中原子-原子接触的可能性

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摘要

The likelihood of occurrence of intermolecular contacts in crystals of halogenated organic compounds has been analysed statistically using tools based on the Hirshfeld surface. Several families of small halogenated molecules (containing organic F, Cl, Br or I atoms) were analysed, based on chemical composition and aromatic or aliphatic character. The behaviour of crystal contacts was also probed for molecules containing O or N. So-called halogen bonding (a halogen making short interactions with O or N, or a π interaction with C) is generally disfavoured, except when H is scarce on the molecular surface. Similarly, halogen⋯halogen contacts are more rare than expected, except for molecules that are poor in H. In general, the H atom is found to be the preferred partner of organic halogen atoms in crystal structures. On the other hand, C⋯C interactions in parallel π-stacking have a high propensity to occur in halogenated aromatic molecules. The behaviour of the four different halogen species (F, Cl, Br, I) is compared in several chemical composition contexts. The analysis tool can be refined by distinguishing several types for a given chemical species, such as H atoms bound to O or C. Such distinction shows, for instance, that C—H⋯Cl and O—H⋯O are the preferred interactions in compounds containing both O and Cl.
机译:已使用基于Hirshfeld表面的工具对卤代有机化合物晶体中发生分子间接触的可能性进行了统计分析。根据化学成分和芳香族或脂肪族特征,分析了几族小卤化分子(含有有机F,Cl,Br或I原子)。还针对包含O或N的分子研究了晶体接触的行为。通常不建议使用所谓的卤素键(卤素与O或N发生短相互作用,或与C发生π相互作用),除非分子中缺乏H。表面。同样,卤素与卤素的接触比预期的稀少,除了分子中的H较差。通常,H原子是晶体结构中有机卤素原子的首选配偶体。另一方面,在平行的π堆积中的C⋯C相互作用在卤化的芳族分子中具有很高的发生倾向。在几种化学成分中比较了四种不同卤素物种(F,Cl,Br,I)的行为。可以通过区分给定化学种类的几种类型(例如与O或C结合的H原子)来完善分析工具。例如,这种区分表明C–H⋯Cl和O–H⋯O是其中的首选相互作用同时含有O和Cl的化合物。

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