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Isolation and expansion of the catabolic potential of a Pseudomonas putida strain able to grow in the presence of high concentrations of aromatic hydrocarbons.

机译:假单胞菌假单胞菌菌株的分解代谢潜能的分离和扩增该菌株在高浓度的芳烃存在下能够生长。

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摘要

Pseudomonas putida DOT-T1 was isolated after enrichment on minimal medium with 1% (vol/vol) toluene as the sole C source. The strain was able to grow in the presence of 90% (vol/vol) toluene and was tolerant to organic solvents whose log P(ow) (octanol/water partition coefficient) was higher than 2.3. Solvent tolerance was inducible, as bacteria grown in the absence of toluene required an adaptation period before growth restarted. Mg2+ ions in the culture medium improved solvent tolerance. Electron micrographs showed that cells growing on high concentrations of toluene exhibited a wider periplasmic space than cells growing in the absence of toluene and preserved the outer membrane integrity. Polarographic studies and the accumulation of pathway intermediates showed that the strain used the toluene-4-monooxygenase pathway to catabolyze toluene. Although the strain also thrived in high concentrations of m- and p-xylene, these hydrocarbons could not be used as the sole C source for growth. The catabolic potential of the isolate was expanded to include m- and p-xylene and related hydrocarbons by transfer of the TOL plasmid pWW0-Km.
机译:在含有1%(体积/体积)甲苯作为唯一碳源的基本培养基中富集后,分离恶臭假单胞菌DOT-T1。该菌株能够在90%(体积/体积)的甲苯存在下生长,并且能够耐受log P(ow)(辛醇/水分配系数)高于2.3的有机溶剂。溶剂耐受性是可诱导的,因为在不存在甲苯的情况下生长的细菌在重新开始生长之前需要一个适应期。培养基中的Mg2 +离子提高了溶剂耐受性。电子显微照片显示,与不含甲苯的细胞相比,在高浓度的甲苯上生长的细胞显示出更宽的周质空间,并保留了外膜的完整性。极谱研究和途径中间体的积累表明,该菌株利用甲苯-4-单加氧酶途径来分解甲苯。尽管该菌株在高浓度的间二甲苯和对二甲苯中也蓬勃发展,但这些烃不能用作唯一的C增长源。通过转移TOL质粒pWW0-Km,分离物的分解代谢潜力扩大到包括间二甲苯和对二甲苯以及相关的烃类。

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