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The effect of stimulation type head modeling and combined EEG and MEG on the source reconstruction of the somatosensory P20/N20 component

机译:刺激类型头部模型以及EEG和MEG结合对体感P20 / N20组件来源重建的影响

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摘要

Modeling and experimental parameters influence the Electro‐ (EEG) and Magnetoencephalography (MEG) source analysis of the somatosensory P20/N20 component. In a sensitivity group study, we compare P20/N20 source analysis due to different stimulation type (Electric‐Wrist [EW], Braille‐Tactile [BT], or Pneumato‐Tactile [PT]), measurement modality (combined EEG/MEG – EMEG, EEG, or MEG) and head model (standard or individually skull‐conductivity calibrated including brain anisotropic conductivity). Considerable differences between pairs of stimulation types occurred (EW‐BT: 8.7 ± 3.3 mm/27.1° ± 16.4°, BT‐PT: 9 ± 5 mm/29.9° ± 17.3°, and EW‐PT: 9.8 ± 7.4 mm/15.9° ± 16.5° and 75% strength reduction of BT or PT when compared to EW) regardless of the head model used. EMEG has nearly no localization differences to MEG, but large ones to EEG (16.1 ± 4.9 mm), while source orientation differences are non‐negligible to both EEG (14° ± 3.7°) and MEG (12.5° ± 10.9°). Our calibration results show a considerable inter‐subject variability (3.1–14 mS/m) for skull conductivity. The comparison due to different head model show localization differences smaller for EMEG (EW: 3.4 ± 2.4 mm, BT: 3.7 ± 3.4 mm, and PT: 5.9 ± 6.8 mm) than for EEG (EW: 8.6 ± 8.3 mm, BT: 11.8 ± 6.2 mm, and PT: 10.5 ± 5.3 mm), while source orientation differences for EMEG (EW: 15.4° ± 6.3°, BT: 25.7° ± 15.2° and PT: 14° ± 11.5°) and EEG (EW: 14.6° ± 9.5°, BT: 16.3° ± 11.1° and PT: 12.9° ± 8.9°) are in the same range. Our results show that stimulation type, modality and head modeling all have a non‐negligible influence on the source reconstruction of the P20/N20 component. The complementary information of both modalities in EMEG can be exploited on the basis of detailed and individualized head models.
机译:建模和实验参数会影响体感P20 / N20组件的电(EEG)和磁脑图(MEG)源分析。在敏感性小组研究中,我们比较了由于不同刺激类型(电腕[EW],盲文触觉[BT]或气胸触觉[PT]),测量方式(EEG / MEG组合– EMEG,EEG或MEG)和头部模型(经过标准或单独校准的颅骨电导率,包括大脑各向异性电导率)。成对的刺激类型之间存在相当大的差异(EW‐BT:8.7±3.3 mm / 27.1°±±16.4°,BT‐PT:9±5 mm / 29.9°±±17.3°,EW‐PT:9.8±7.4 mm / 15.9与EW相比,BT或PT的强度降低了±16.5°,强度降低了75%),无论使用哪种头部型号。 EMEG对MEG几乎没有定位差异,但对EEG却有较大的定位差异(16.1±±4.9 mm),而对于EEG(14°±±3.7°)和MEG(12.5°±±10.9°)而言,源方向的差异是不可忽略的。我们的校准结果表明,颅骨电导率存在很大的受试者间差异(3.1–14 mS / m)。不同头部模型的比较显示,EMEG(EW:3.4±2.4 mm,BT:3.7±3.4 mm,PT:5.9±6.8 mm)的定位差异小于EEG(EW:8.6±8.3 mm,BT:11.8) ±6.2 mm,PT:10.5±±5.3 mm),而EMEG(EW:15.4°±±6.3°,BT:25.7°±±15.2°和PT:14°±±11.5°)和EEG(EW:14.6)的光源方向差异±9.5°,BT:16.3±11.1°和PT:12.9±8.9°)在同一范围内。我们的结果表明,刺激类型,模态和头部建模对P20 / N20组件的源重构均具有不可忽略的影响。可以基于详细的个性化头部模型来利用EMEG中两种模式的补充信息。

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