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Carbonized Dehydroascorbic Acid: Aim for Targeted Repair of Graphene Defects and Bridge Connection of Graphene Sheets with Small Size

机译:碳化脱氢抗坏血酸:旨在针对性修复石墨烯缺陷和小尺寸石墨烯片的桥连接

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摘要

The thermal dissipation issue of electronics devices becomes increasingly prominent as they evolve to smaller sizes and more complicated structures. Therefore, the development of materials with excellent heat conduction properties and light weight turns out to be an urgent demand to solve the heat transfer problem of electronics devices with high performance. For this purpose, we put forward an innovative strategy that carbonized dehydroascorbic acid (CDA) be applied to graphene layers for the targeted repair of defects among them and bridge connection of the layers to produce graphene heat conduction materials with excellent properties. Firstly, hydrogen bonds formed from dehydroascorbic acid (DHAA, products of the oxidation of vitamin C) and each of ketone, carboxyl, and oxhydryl groups on graphene layers were absorbed at targeted locations where oxidation graphene produces defects, then targeted repair was conducted for those defects to be filled and for the graphene layers of a small size to grow into large sheet materials with improved continuity by CDA generated in thermally pressing reduction reaction at 800 °C. In our investigation, the planar thermal conductivity of rGO/VC membrane reached 1031.9 ± 10.2 Wm K , while the added mass content of vitamin C (VC) was 15%. Being a reference, the planar thermal conductivity of primitive graphene membrane was only 610.7 ± 11.7 Wm K .
机译:随着电子设备向更小尺寸和更复杂的结构发展,其散热问题变得日益突出。因此,开发具有优良导热性能和轻质的材料成为解决高性能电子设备传热问题的迫切需求。为此,我们提出了一种创新策略,即将碳化脱氢抗坏血酸(CDA)应用于石墨烯层,以有针对性地修复其中的缺陷并桥接各层,从而生产出具有优异性能的石墨烯导热材料。首先,将脱氢抗坏血酸(DHAA,维生素C的氧化产物)与石墨烯层上的酮,羧基和羟基所形成的氢键吸收到氧化石墨烯产生缺陷的目标位置,然后针对这些目标进行修复。通过在800℃的热压还原反应中生成的CDA,可以填充缺陷,并使小尺寸的石墨烯层生长成具有改善的连续性的小尺寸石墨烯层。在我们的研究中,rGO / VC膜的平面热导率达到1031.9±10.2 Wm K,而维生素C(VC)的添加质量含量为15%。作为参考,原始石墨烯膜的平面热导率仅为610.7±11.7 Wm K。

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