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Low‐Thermal‐Budget Doping of 2D Materials in Ambient Air Exemplified by Synthesis of Boron‐Doped Reduced Graphene Oxide

机译:硼掺杂还原氧化石墨烯的合成举例说明了环境空气中二维材料的低热预算掺杂

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摘要

Graphene oxide (GO) doping and reduction allow for physicochemical property modification to suit practical application needs. Herein, the challenge of simultaneous low‐thermal‐budget heteroatom doping of GO and its reduction in ambient air is addressed through the synthesis of B‐doped reduced GO (B@rGO) by flash irradiation of boric acid loaded onto a GO support with intense pulsed light (IPL). The effects of light power and number of shots on the in‐depth sequential doping and reduction mechanisms are investigated by ex situ X‐ray photoelectron spectroscopy and direct millisecond‐scale temperature measurements (temperature >1600 °C, < 10‐millisecond duration, ramping rate of 5.3 × 10 °C s ). Single‐flash IPL allows the large‐scale synthesis of substantially doped B@rGO (≈3.60 at% B) to be realized with a thermal budget 10 ‐fold lower than that of conventional thermal methods, and the prepared material with abundant B active sites is employed for highly sensitive and selective room‐temperature NO sensing. Thus, this work showcases the great potential of optical annealing for millisecond‐scale ultrafast reduction and heteroatom doping of GO in ambient air, which allows the tuning of multiple physicochemical GO properties.
机译:氧化石墨烯(GO)的掺杂和还原可以理化物理化学性质,以适应实际应用需求。在这里,GO的低热预算杂原子掺杂及其在周围空气中的减少同时面临的挑战,是通过将硼酸快速照射到强力吸附在GO载体上的硼酸的合成来合成B掺杂的还原GO(B @ rGO)来解决的。脉冲光(IPL)。通过异位X射线光电子能谱和直接毫秒级温度测量(温度> 1600°C,持续时间小于10毫秒,持续升温)来研究光功率和发射次数对深度顺序掺杂和还原机理的影响速率为5.3×10°C s)。单闪式IPL可以大规模合成基本掺杂的B @ rGO(约3.60 at%B),其热预算比传统热方法低10倍,并且制备的材料具有丰富的B活性位用于高度敏感和选择性的室温NO感应。因此,这项工作展示了光退火在环境空气中进行毫秒级超快还原和GO杂原子掺杂方面的巨大潜力,从而可以调节多种物理化学GO特性。

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