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Visualizing Flock House Virus infection in Drosophila cells with correlated fluorescence and electron microscopy

机译:用相关的荧光和电子显微镜观察果蝇细胞中的鸡群病毒感染情况

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摘要

Virus assembly occurs in a complex environment and is dependent upon viral and cellular components being properly correlated in time and space. The simplicity of the Flock House virus (FHV) capsid and the extensive structural, biochemical, and genetic characterization of the virus make it an excellent system for studying in vivo virus assembly. The tetracysteine motif (CCPGCC), that induces fluorescence in bound biarsenical compounds (FlAsH and ReAsH), was genetically inserted in the coat protein, to visualize this gene product during virus infection. The small size of this modification when compared to those made by traditional fluorescent proteins minimizes disruption of the coat proteins numerous functions. ReAsH not only fluoresces when bound to the tetracysteine motif but also allows correlated electron microscopy (EM) of the same cell following photoconversion and osmium staining. These studies demonstrated that the coat protein was concentrated in discrete patches in the cell. High pressure freezing (HPF) followed by freeze substitution (FS) of infected cells showed that these patches were formed by virus particles in crystalline arrays. EM tomography (EMT) of the HPF/FS prepared samples showed that these arrays were proximal to highly modified mitochondria previously established to be the site of RNA replication. Two features of the mitochondrial modification are ~60 nm spherules that line the outer membrane and the large chamber created by the convolution induced in the entire organelle.
机译:病毒组装发生在复杂的环境中,并且取决于病毒和细胞成分在时间和空间上的正确关联。群禽病毒(FHV)衣壳的简单性以及该病毒的广泛结构,生化和遗传特性使其成为研究体内病毒装配的极佳系统。将在结合的双砷化合物(FlAsH和ReAsH)中诱导荧光的四半胱氨酸基序(CCPGCC)基因插入外壳蛋白中,以在病毒感染期间可视化该基因产物。与由传统的荧光蛋白制成的修饰相比,这种修饰的小尺寸使对外壳蛋白众多功能的破坏最小化。 ReAsH不仅在与四半胱氨酸基序结合时发出荧光,而且还允许在光转换和染色后对同一细胞进行相关的电子显微镜(EM)。这些研究表明外壳蛋白集中在细胞中的离散斑块中。高压冷冻(HPF),然后冷冻替换(FS)的感染细胞表明,这些补丁是由晶体阵列中的病毒颗粒形成的。 HPF / FS制备的样品的EM断层扫描(EMT)显示,这些阵列与先前建立为RNA复制位点的高度修饰的线粒体接近。线粒体修饰的两个特征是〜60 nm的小球,排列在外膜和由整个细胞器中的卷积产生的大腔室中。

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