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Temperature dependence of time-resolved photoluminescence in closely packed alignment of Si nanodisks with SiC barriers

机译:带有SiC势垒的Si纳米盘紧密堆积排列中时间分辨光致发光的温度依赖性

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摘要

We study the temperature dependence of time-resolved photoluminescence (PL) in closely packed alignment of Si nanodisks (NDs) with SiC barriers, fabricated by neutral beam etching using bio-nano-templates. The PL time profile indicates three decaying components with different decay times. The PL intensities in the two slower decaying components depend strongly on temperature. These temperature dependences of the PL intensity can be quantitatively explained by a three-level model with thermal activation energies of 410 and 490 meV, depending on the PL components. The activation energies explain PL quenching due to thermal escape of electrons from individual NDs. This thermal escape affects the PL decay times above 250 K. Dark states of photo-excited carriers originating from the separate localization of electron and hole into different NDs are elucidated with the localization energies of 70 and 90 meV. In contrast, the dynamics of the fastest PL decaying component is dominated by electron tunneling among NDs, where the PL intensity and decay time are constant for temperature.
机译:我们研究了时间分辨光致发光(PL)在具有SiC阻挡层的Si纳米盘(NDs)紧密堆积的对准中的时间依赖性,该对准是通过使用生物纳米模板通过中性束蚀刻制造的。 PL时间曲线表示三个具有不同衰减时间的衰减分量。两个衰减较慢的分量中的PL强度很大程度上取决于温度。 PL强度的这些温度依赖性可以通过具有PL和410 meV的热激活能的三级模型来定量解释。活化能解释了由于电子从各个ND分子逃逸而导致的PL猝灭。这种热逸散会影响250 K以上的PL衰减时间。用70和90 meV的定位能量阐明了源自电子和空穴分别定位到不同ND中的光激发载流子的暗态。相反,最快的PL衰减分量的动力学由ND之间的电子隧穿控制,其中PL强度和衰减时间对于温度是恒定的。

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