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Indium-doped ZnO nanowires with infrequent growth orientation rough surfaces and low-density surface traps

机译:铟掺杂的ZnO纳米线生长方向不频繁表面粗糙且表面陷阱低

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摘要

Indium-doped ZnO nanowires have been prepared by vapor transport deposition. With increasing In content, the growth orientation of the nanowires switches from [101_0] to infrequent [022_3] and the surface becomes rough. No surface-related exciton emission is observed in these nanowires. The results indicate that large surface-to-volume ratio, high free electron concentration, and low density of surface traps can be achieved simultaneously in ZnO nanowires via In doping. These unique properties make In-doped ZnO nanowire a potential material for photocatalysis application, which is demonstrated by the enhanced photocatalytic degradation of Rhodamine B.
机译:铟掺杂的ZnO纳米线已经通过气相沉积法制备。随着In含量的增加,纳米线的生长方向从[10 1 _ 0]很少[02 <数学xmlns:mml =“ http://www.w3.org/1998/Math/MathML” id =“ M2” name =“ 1556-276X-8-493-i3” overflow =“ scroll”> < mrow> 2 _ 3],表面变得粗糙。在这些纳米线中未观察到与表面有关的激子发射。结果表明,通过In掺杂,可以在ZnO纳米线中同时实现大的表面体积比,高的自由电子浓度和低的表面陷阱密度。这些独特的性质使In掺杂的ZnO纳米线成为光催化应用的潜在材料,罗丹明B的增强的光催化降解证明了这一点。

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