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Application of a dummy eye shield for electron treatment planning

机译:假人眼罩在电子治疗计划中的应用

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摘要

Metallic eye shields have been widely used for near-eye treatments to protect critical regions, but have never been incorporated into treatment plans because of the unwanted appearance of the metal artifacts on CT images. The purpose of this work was to test the use of an acrylic dummy eye shield as a substitute for a metallic eye shield during CT scans. An acrylic dummy shield of the same size as the tungsten eye shield was machined and CT scanned. The BEAMnrc and the DOSXYZnrc were used for the Monte Carlo (MC) simulation, with the appropriate material information and density for the aluminum cover, steel knob and tungsten body of the eye shield. The Pinnacle adopting the Hogstrom electron pencil-beam algorithm was used for the one-port 6-MeV beam plan after delineation and density override of the metallic parts. The results were confirmed with the metal oxide semiconductor field effect transistor (MOSFET) detectors and the Gafchromic EBT2 film measurements. For both the maximum eyelid dose over the shield and the maximum dose under the shield, the MC results agreed with the EBT2 measurements within 1.7%. For the Pinnacle plan, the maximum dose under the shield agreed with the MC within 0.3%; however, the eyelid dose differed by –19.3%. The adoption of the acrylic dummy eye shield was successful for the treatment plan. However, the Pinnacle pencil-beam algorithm was not sufficient to predict the eyelid dose on the tungsten shield, and more accurate algorithms like MC should be considered for a treatment plan.
机译:金属眼罩已被广泛用于近眼治疗中以保护关键区域,但由于CT图像上金属假象不希望出现,因此从未被纳入治疗计划。这项工作的目的是测试在CT扫描中使用丙烯酸假人眼罩替代金属眼罩的情况。加工大小与钨钢眼罩相同的丙烯酸假人罩并进行CT扫描。 BEAMnrc和DOSXYZnrc用于蒙特卡洛(MC)仿真,并为眼罩的铝盖,钢制旋钮和钨体提供了适当的材料信息和密度。对金属零件进行划定和密度覆盖后,采用采用Hogstrom电子笔束算法的Pinnacle进行单端口6-MeV射束计划。用金属氧化物半导体场效应晶体管(MOSFET)检测器和Gafchromic EBT2膜测量结果证实了结果。对于防护罩上方的最大眼睑剂量和防护罩下方的最大剂量,MC结果与EBT2测量值相吻合在1.7%之内。对于Pinnacle计划,盾牌下的最大剂量与MC一致,在0.3%以内;然而,眼睑剂量相差–19.3%。治疗计划成功采用了丙烯酸假人眼罩。然而,品尼高笔形束算法不足以预测钨屏蔽物上的眼睑剂量,因此应考虑使用更精确的算法(例如MC)来制定治疗计划。

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