Paramagnetic Intrinsic Defects in Polycrystalline Large-Area 2D MoS2 Films Grown on SiO2 by Mo Sulfurization

摘要

A low-temperature electron spin resonance study has been carried out on large-area high-purity polycrystalline two-dimensional few monolayer (ML) 2H MoS2 films synthesized by sulfurization of Mo layers, with intent to atomically assess mobility-degrading detrimental point defects. This reveals the presence of a distinct previously unreported anisotropic defect of axial symmetry about the c-axis characterized by g // = 2.00145 and g ⊥ = 2.0027, with corresponding density (spin S = ½) ~3 × 10¹² cm⁻² for a 4 ML thick film. Inverse correlation of the defect density with grain size points to a domain boundary associated defect, inherently incorporated during sample growth. Based on the analysis of ESR signal features in combination with literature data, the signal is tentatively ascribed to the a (di)sulfur antisite defect (S or S2 substituting for a Mo atom). Beset by these defects, the grain boundaries thus emerge as an intolerable threat for the carrier mobility and layer functionality.