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Independent Band Modulation in 2D van der Waals Heterostructures via a Novel Device Architecture

机译:通过新型器件架构实现二维范德华异质结构中的独立带调制

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摘要

Benefiting from the technique of vertically stacking 2D layered materials (2DLMs), an advanced novel device architecture based on a top‐gated MoS2/WSe2 van der Waals (vdWs) heterostructure is designed. By adopting a self‐aligned metal screening layer (Pd) to the WSe2 channel, a fixed p‐doped state of the WSe2 as well as an independent doping control of the MoS2 channel can be achieved, thus guaranteeing an effective energy‐band offset modulation and large through current. In such a device, under specific top‐gate voltages, a sharp PN junction forms at the edge of the Pd layer and can be effectively manipulated. By varying top‐gate voltages, the device can be operated under both quasi‐Esaki diode and unipolar‐Zener diode modes with tunable current modulations. A maximum gate‐coupling efficiency as high as ≈90% and a subthreshold swing smaller than 60 mV dec−1 can be achieved under the band‐to‐band tunneling regime. The superiority of the proposed device architecture is also confirmed by comparison with a traditional heterostructure device. This work demonstrates the feasibility of a new device structure based on vdWs heterostructures and its potential in future low‐power electronic and optoelectronic device applications.
机译:受益于垂直堆叠2D分层材料(2DLM)的技术,设计了一种基于顶层MoS2 / WSe2 van der Waals(vdWs)异质结构的先进新型器件架构。通过对WSe2通道采用自对准金属屏蔽层(Pd),可以实现WSe2的固定p掺杂状态以及MoS2通道的独立掺杂控制,从而确保有效的能带偏移调制和大电流。在这样的器件中,在特定的顶栅电压下,尖锐的PN结会在Pd层的边缘形成,并且可以有效地进行操作。通过改变顶栅电压,该器件可以在具有可调电流调制的准Esaki二极管和单极性Zener二极管模式下工作。在带间隧穿机制下,可以实现高达≈90%的最大栅极耦合效率和小于60 mV dec -1 的亚阈值摆幅。与传统的异质结构器件相比,所提出的器件架构的优越性也得到了证实。这项工作证明了基于vdWs异质结构的新型器件结构的可行性及其在未来低功耗电子和光电器件应用中的潜力。

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