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Aligned Chemically Etched Silver Nanowire Monolayer as Surface-Enhanced Raman Scattering Substrates

机译:排列化学蚀刻的银纳米线单层作为表面增强拉曼散射基板

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摘要

Silver nanowires (AgNWs) were chemically etched to significantly increase the surface roughness and then self-assembled on the liquid/gas interfaces via the interfacial assembly method to obtain aligned chemically etched silver nanowire films. The as-fabricated silver nanowire films were used as novel surface-enhanced Raman scattering (SERS) substrates. The morphologies and plasmon characteristics of the substrates were investigated using multiple measurement methods. The performance of as-fabricated substrates was measured using rhodamine B as a probe. The detection limitation can be as low as 10−11 M. The greatly improved plasmonic properties are attributed to the efficient light coupling and larger electromagnetic field enhancement. The novel set of SERS substrates of aligned chemically etched AgNWs is believed to be important for efficient, homogeneous, and ultrasensitive SERS sensing applications.
机译:化学蚀刻银纳米线(AgNWs)以显着增加表面粗糙度,然后通过界面组装方法自组装在液/气界面上,以获得对准的化学蚀刻银纳米线膜。所制造的银纳米线薄膜被用作新型表面增强拉曼散射(SERS)衬底。使用多种测量方法研究了基板的形貌和等离激元特性。使用罗丹明B作为探针测量了制成的基材的性能。检测极限可低至10 -11 M。等离激元特性的极大改善归因于有效的光耦合和更大的电磁场增强。对齐化学蚀刻AgNW的新型SERS基板组被认为对于有效,均匀和超灵敏的SERS传感应用非常重要。

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