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Origins of Ripples in CVD-Grown Few-layered MoS2 Structures under Applied Strain at Atomic Scales

机译:原子尺度下应用应变下CVD生长的几层MoS2结构中波纹的起源

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摘要

The potential of the applicability of two-dimensional molybdenum disulfide (MoS2) structures, in various electronics, optoelectronics, and flexible devices requires a fundamental understanding of the effects of strain on the electronic, magnetic and optical properties. Particularly important is the recent capability to grow large flakes of few-layered structures using chemical vapor deposition (CVD) wherein the top layers are relatively smaller in size than the bottom layers, resulting in the presence of edges/steps across adjacent layers. This paper investigates the strain response of such suspended few-layered structures at the atomic scales using classic molecular dynamics (MD) simulations. MD simulations suggest that the suspended CVD-grown structures are able to relax the applied in-plane strain through the nucleation of ripples under both tensile and compressive loading conditions. The presence of terraced edges in these structures is the cause for the nucleation of ripples at the edges that grow towards the center of the structure under applied in-plane strains. The peak amplitudes of ripples observed are in excellent agreement with the experimental observations. The study provides critical insights into the mechanisms of strain relaxation of suspended few-layered MoS2 structures that determine the interplay between the mechanical response and the electronic properties of CVD-grown structures.
机译:二维二硫化钼(MoS2)结构在各种电子设备,光电设备和柔性设备中的应用潜力需要对应变对电子,磁性和光学特性的影响有基本的了解。特别重要的是最近使用化学气相沉积(CVD)来生长几层结构的大薄片的能力,其中顶层的尺寸比底层的尺寸小,从而导致相邻层之间存在边缘/台阶。本文使用经典的分子动力学(MD)模拟研究了这种悬浮的多层结构在原子尺度上的应变响应。 MD模拟表明,悬浮的CVD生长的结构能够通过在拉伸和压缩载荷条件下的波纹形核来缓和施加的面内应变。这些结构中存在梯形边缘是在施加的面内应变作用下向结构中心生长的边缘处的波纹形核的原因。观察到的波纹的峰值幅度与实验观察结果非常吻合。这项研究提供了关键的见解,以了解悬浮的多层MoS2结构的应变松弛机理,这些机理决定了CVD生长结构的机械响应和电子特性之间的相互作用。

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