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Strongly Enhanced THz Emission caused by Localized Surface Charges in Semiconducting Germanium Nanowires

机译:半导体锗纳米线中局部表面电荷引起的THz发射大大增强

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摘要

A principal cause of THz emission in semiconductor nanostructures is deeply involved with geometry, which stimulates the utilization of indirect bandgap semiconductors for THz applications. To date, applications for optoelectronic devices, such as emitters and detectors, using THz radiation have focused only on direct bandgap materials. This paper reports the first observation of strongly enhanced THz emission from Germanium nanowires (Ge NWs). The origin of THz generation from Ge NWs can be interpreted using two terms: high photoexcited electron-hole carriers (Δn) and strong built-in electric field (Eb) at the wire surface based on the relation . The first is related to the extensive surface area needed to trigger an irradiated photon due to high aspect ratio. The second corresponds to the variation of Fermi-level determined by confined surface charges. Moreover, the carrier dynamics of optically excited electrons and holes give rise to phonon emission according to the THz region.
机译:半导体纳米结构中太赫兹发射的主要原因与几何结构密切相关,这刺激了间接带隙半导体在太赫兹应用中的利用。迄今为止,使用太赫兹辐射的光电子设备(例如发射器和检测器)的应用仅集中在直接带隙材料上。本文首次报道了锗纳米线(Ge NWs)显着增强THz发射的现象。 Ge NWs产生THz的起源可以用两个术语来解释:基于该关系,高光激发电子空穴载流子(Δn)和导线表面的强内置电场(Eb)。第一个与高纵横比导致触发辐射光子所需的大表面积有关。第二个对应于费米能级由有限表面电荷决定的变化。此外,根据THz区域,光激发电子和空穴的载流子动力学会引起声子发射。

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