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Hexagonal Boron Nitride assisted transfer and encapsulation of large area CVD graphene

机译:六方氮化硼辅助大面积CVD石墨烯的转移和包封

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摘要

We report a CVD hexagonal boron nitride (hBN-) assisted transfer method that enables a polymer-impurity free transfer process and subsequent top encapsulation of large-area CVD-grown graphene. We demonstrate that the CVD hBN layer that is utilized in this transfer technique acts as a buffer layer between the graphene film and supporting polymer layer. We show that the resulting graphene layers possess lower doping concentration, and improved carrier mobilities compared to graphene films produced by conventional transfer methods onto untreated SiO2/Si, SAM-modified and hBN covered SiO2/Si substrates. Moreover, we show that the top hBN layer used in the transfer process acts as an effective top encapsulation resulting in improved stability to ambient exposure. The transfer method is applicable to other CVD-grown 2D materials on copper foils, thereby facilitating the preparation of van der Waals heterostructures with controlled doping.
机译:我们报告了一种CVD六方氮化硼(hBN-)辅助转移方法,该方法可实现无聚合物杂质的转移过程以及随后大面积CVD生长的石墨烯的顶部封装。我们证明了在此转移技术中使用的CVD hBN层充当了石墨烯薄膜和支撑聚合物层之间的缓冲层。我们表明,与通过常规转移方法在未经处理的SiO2 / Si,SAM改性和hBN覆盖的SiO2 / Si衬底上生产的石墨烯薄膜相比,所得石墨烯层具有较低的掺杂浓度和改善的载流子迁移率。此外,我们表明,在转移过程中使用的顶层hBN层可作为有效的顶层封装,从而提高对环境暴露的稳定性。该转移方法适用于铜箔上的其他CVD生长的2D材料,从而有助于在受控掺杂下制备范德华异质结构。

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