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Realization of a vertical topological p–n junction in epitaxial Sb2Te3/Bi2Te3 heterostructures

机译:外延Sb2Te3 / Bi2Te3异质结构中垂直拓扑p–n结的实现

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摘要

Three-dimensional (3D) topological insulators are a new state of quantum matter, which exhibits both a bulk band structure with an insulating energy gap as well as metallic spin-polarized Dirac fermion states when interfaced with a topologically trivial material. There have been various attempts to tune the Dirac point to a desired energetic position for exploring its unusual quantum properties. Here we show a direct experimental proof by angle-resolved photoemission of the realization of a vertical topological p–n junction made of a heterostructure of two different binary 3D TI materials Bi2Te3 and Sb2Te3 epitaxially grown on Si(111). We demonstrate that the chemical potential is tunable by about 200 meV when decreasing the upper Sb2Te3 layer thickness from 25 to 6 quintuple layers without applying any external bias. These results make it realistic to observe the topological exciton condensate and pave the way for exploring other exotic quantum phenomena in the near future.
机译:三维(3D)拓扑绝缘体是一种量子态的新状态,当与拓扑琐碎的材料连接时,它既显示具有绝缘能隙的块状结构,又显示出金属自旋极化的狄拉克费米子态。已经进行了各种尝试来将狄拉克点调整到期望的能量位置,以探索其不寻常的量子特性。在这里,我们通过角分辨光发射显示了直接实验证明,该实现是由两种不同的二元3D TI材料Bi2Te3和Sb2Te3外延生长在Si(111)上的异质结构构成的垂直拓扑p–n结的实现。我们证明,在不施加任何外部偏压的情况下,将上层Sb2Te3层的厚度从25减少到6倍时,化学势可调节约200µmeV。这些结果使观察拓扑激子凝聚物成为现实,并为在不久的将来探索其他奇异量子现象铺平了道路。

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