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Colloidal silicon quantum dots: synthesis and luminescence tuning from the near-UV to the near-IR range

机译:胶态硅量子点:从近紫外到近红外范围的合成和发光调谐

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摘要

This review describes a series of representative synthesis processes, which have been developed in the last two decades to prepare silicon quantum dots (QDs). The methods include both top-down and bottom-up approaches, and their methodological advantages and disadvantages are presented. Considerable efforts in surface functionalization of QDs have categorized it into (i) a two-step process and (ii) in situ surface derivatization. Photophysical properties of QDs are summarized to highlight the continuous tuning of photoluminescence color from the near-UV through visible to the near-IR range. The emission features strongly depend on the silicon nanostructures including QD surface configurations. Possible mechanisms of photoluminescence have been summarized to ascertain the future challenges toward industrial use of silicon-based light emitters.
机译:这篇综述描述了一系列代表性的合成工艺,这些工艺在最近的二十年中已经开发出来,用于制备硅量子点(QD)。这些方法包括自上而下和自下而上的方法,并介绍了它们的方法学优点和缺点。量子点表面功能化方面的大量努力将其分为(i)两步过程和(ii)原位表面衍生化。总结了量子点的光物理性质,以突出显示从近紫外到可见光到近红外范围内的光致发光颜色的连续调节。发射特征在很大程度上取决于包括QD表面配置在内的硅纳米结构。总结了可能的光致发光机理,以确定在工业上使用硅基发光体的未来挑战。

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